Position measuring device, position measurement method, exposure apparatus, exposure method, and superposition measuring device and superposition measurement method
First Claim
1. A position measuring device comprising a calculation unit which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object,wherein the calculation unit includes a processing unit which performs predetermined processing on predetermined information to be used when calculating the mark position information, and generates a plurality of processing information, andthe position measuring device further comprises a correction unit which is electrically connected to the calculation unit and corrects calculation results from the calculation unit based on a difference between a plurality of the mark position information calculated by the calculation unit using the plurality of processing information, whereinof the plurality of mark position information, if a first position information is termed CH, a second position information is termed CL, and a predetermined coefficient is termed R (R>
- 0),the first position information CH is calculated from a higher resolution signal than the second position information CL, andthe correction unit performs corrections based on a result determined by (CL−
CH)×
R.
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Accused Products
Abstract
This position measuring device comprising a calculation unit 19 calculates mark position information relating to the position of the mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object W, and a correction device 19 for correcting the calculation results from the calculation unit 19 based on the asymmetry of the mark signal.
As a result, positional deviation resulting from asymmetry can be detected, and by correcting for this deviation the effect that the image asymmetry has on the measurement can be reduced. Therefore, a more accurate high precision alignment can be performed, and there is no requirement to increase the NA of the detection optical system, nor to prepare a special short wavelength light source, meaning increases in the size and cost of the apparatus can also be prevented.
24 Citations
48 Claims
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1. A position measuring device comprising a calculation unit which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object,
wherein the calculation unit includes a processing unit which performs predetermined processing on predetermined information to be used when calculating the mark position information, and generates a plurality of processing information, and the position measuring device further comprises a correction unit which is electrically connected to the calculation unit and corrects calculation results from the calculation unit based on a difference between a plurality of the mark position information calculated by the calculation unit using the plurality of processing information, wherein of the plurality of mark position information, if a first position information is termed CH, a second position information is termed CL, and a predetermined coefficient is termed R (R> - 0),
the first position information CH is calculated from a higher resolution signal than the second position information CL, and the correction unit performs corrections based on a result determined by (CL−
CH)×
R. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
- 0),
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12. A position measuring device comprising a calculation unit which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object,
wherein the mark signal includes phases of diffracted light of different orders generated from the mark, and the position measuring device further comprises a correction unit which is electrically connected to the calculation unit and corrects calculation results from the calculation unit based on a difference between a plurality of the mark position information calculated from a plurality of the phases, wherein of the plurality of mark position information, if a first position information is termed CH, a second position information is termed CL, and a predetermined coefficient is termed R (R> - 0),
the first position information CH is calculated from a higher resolution signal than the second position information CL, the correction unit performs corrections based on a result determined by (CL−
CH)×
R, andthe higher resolution signal incorporates a higher frequency component than a frequency component of a signal used when obtaining the second position information CL. - View Dependent Claims (13, 14)
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15. A position measuring device comprising a calculation unit which calculates mark position information relating to a position of a mark formed on an object, by performing template matching between a template having a predetermined frequency configuration and a mark signal obtained by irradiating a detection beam onto the mark, wherein the position measuring device further comprises:
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a filtering unit which performs either one of a first filtering process which reduces a proportion within the mark signal of a frequency component less than a specified frequency and reduces a proportion within the template of a frequency component less than the specified frequency, and a second filtering process which reduces a proportion of a frequency component less than the specified frequency on a correlation function calculated from the template and the mark signal, and the calculation unit is electrically connected to the filtering unit and calculates the mark position information by either one of performing template matching on the mark signal and the template which have been subjected to the first filtering process, and basing calculations on correlation function which has been subjected to the second filtering process, wherein the filtering unit reduces a proportion of a frequency component within the mark signal having a basic frequency defined based on a shape of the mark, less than a proportion of a frequency component within the mark signal having a frequency greater than the basic frequency. - View Dependent Claims (16, 17, 18)
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19. A position measuring device comprising a calculation unit which calculates mark position information relating to a position of a mark formed on an object, by performing folded autocorrelation of a mark signal obtained by irradiating a detection beam onto the mark, wherein the position measuring device further comprises:
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a filtering unit which performs filtering processing that reduces a proportion within the mark signal of a frequency component less than a specified frequency, and the calculation unit is electrically connected to the filtering unit and calculates the mark position information by performing a folded autocorrelation of the mark signal which has undergone the filtering processing, wherein the filtering unit reduces a proportion of a frequency component within the mark signal having a basic frequency defined based on a shape of the mark, less than a proportion of a frequency component within the mark signal having a frequency greater than the basic frequency. - View Dependent Claims (20, 21)
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22. A position measuring device comprising a calculation unit which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object, wherein the position measuring device further comprises:
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a filtering unit which performs filtering processing of the mark signal, and generating a plurality of mark signals having different frequency configurations, and an extraction unit which is electrically connected to the filtering unit and extracts, from a plurality of mark position information calculated by the calculation unit using the plurality of mark signals, mark position information satisfying a predetermined condition, and a final mark position information is determined based on the extracted mark position information, wherein the extraction unit extracts mark position information calculated based on a mark signal incorporating a larger low frequency component if a difference between the plurality of mark position information is greater than a predetermined value, and extracts mark position information calculated based on a mark signal incorporating a larger high frequency component if the difference is less than or equal to the predetermined value. - View Dependent Claims (23, 24)
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25. A position measuring device comprising a calculation unit which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object, wherein the position measuring device further comprises:
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a filtering unit which performs filtering processing of the mark signal, and generating a plurality of mark signals having different frequency configurations, and an extraction unit which is electrically connected to the filtering unit and extracts, from a plurality of mark position information calculated by the calculation unit using the plurality of mark signals, mark position information satisfying a predetermined condition, and a final mark position information is determined based on the extracted mark position information, wherein the filtering unit reduces a proportion within the mark signal of a frequency component greater than a specified frequency, and in a case where the filtering processing is performed a plurality of times on the mark signal, the filtering is performed following an alteration of the frequency component for which a proportion is to be reduced.
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26. A position measuring method comprising a calculation step which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object,
wherein the calculation step performs predetermined processing on predetermined information to be used when calculating the mark position information, and generates a plurality of processing information, and the position measuring method further includes correcting calculation results from the calculation step based on a difference between a plurality of the mark position information calculated by the calculation step using the plurality of processing information, wherein of the plurality of mark position information, if a first position information is termed CH, a second position information is termed CL, and a predetermined coefficient is termed R (R> - 0),
the first position information CH is calculated from a higher resolution signal than the second position information CL, and corrections are performed based on a result determined by (CL−
CH)×
R. - View Dependent Claims (27, 28, 29, 30, 31)
- 0),
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32. A position measuring method comprising a calculation step which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object,
wherein the mark signal includes phases of diffracted light of different orders generated from the mark, and calculation results from the calculation step are corrected based on a difference between a plurality of mark position information calculated from a plurality of phases, wherein of the plurality of mark position information, if a first position information is termed CH, a second position information is termed CL, and a predetermined coefficient is termed R (R> - 0),
the first position information CH is calculated from a higher resolution signal than the second position information CL, and corrections are performed based on a result determined by (CL−
CH)×
R. - View Dependent Claims (33)
- 0),
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34. A position measuring method using a calculation unit which calculates mark position information relating to a position of a mark formed on an object, by performing template matching between a template having a predetermined frequency configuration and a mark signal obtained by irradiating a detection beam onto the mark, the position measuring method comprising:
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carrying out either one of a first filtering process which reduces a proportion within the mark signal of a frequency component less than a specified frequency and reducing a proportion within the template of a frequency component less than the specified frequency, and a second filtering process which reduces a proportion of a frequency component less than the specified frequency on a correlation function calculated from the template and the mark signal, wherein in the first or second filtering process, within the mark signal, a proportion of a frequency component within the mark signal having a basic frequency defined based on a shape of the mark is reduced even more than a proportion of a frequency component within the mark signal having a frequency greater than the basic frequency, and the calculation unit calculates the mark position information by either one of performing template matching on the mark signal and the template which have been subjected to the first filtering process, and basing calculations on the correlation function which has been subjected to the second filtering process. - View Dependent Claims (35, 36)
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37. A position measuring method using a calculation unit which calculates mark position information relating to a position of a mark formed on an object, by performing folded autocorrelation of a mark signal obtained by irradiating a detection beam onto the mark, the position measuring method comprising:
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performing filtering processing which reduces a proportion within the mark signal of a frequency component less than a specified frequency, wherein in the filtering processing, within the mark signal, a proportion of a frequency component within the mark signal having a basic frequency defined based on a shape of the mark is reduced even more than a proportion of a frequency component within the mark signal having a frequency greater than the basic frequency, and the calculation unit calculates the mark position information by performing a folded autocorrelation of the mark signal which has undergone the filtering processing. - View Dependent Claims (38, 39)
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40. A position measuring method using a calculation unit which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object, the position measuring method comprising:
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performing filtering processing of the mark signal, and generating a plurality of mark signals having different frequency configurations, and extracting, from a plurality of mark position information calculated by the calculation unit using the plurality of mark signals, mark position information satisfying a predetermined condition, and determining a final mark position information based on the extracted mark position information, wherein the filtering processing reduces a proportion within the mark signal of a frequency component greater than a specified frequency, and in a case where the filtering processing is performed a plurality of times on the mark signal, the filtering is performed following an alteration of the frequency component for which a proportion is to be reduced. - View Dependent Claims (41, 42)
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43. A position measuring method using a calculation unit which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object, the position measuring method comprising:
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comparing mark position information calculated by the calculation unit based on the mark signal and a predetermined design value information relating to the mark, and then judging acceptability of the calculated mark position information, performing filtering processing of the mark signal, and generating a mark processed signal having a different frequency configuration from the mark signal subjected to the filtering processing, and in a case where acceptability of the mark signal is denied by the judgment, calculating the mark position information by the calculation unit using the generated mark processed signal, and judging acceptability of the mark position information, and repeating the filtering processing, the calculating of mark position information based on the mark processed signal, and the judging until acceptability of mark position information calculated by the calculation unit is approved, wherein the filtering processing reduces a proportion within the mark signal of a frequency component greater than a specified frequency, and in a case where the filtering processing is performed a plurality of times on the mark signal, the filtering is performed following an alteration of the frequency component for which a proportion is to be reduced. - View Dependent Claims (44)
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45. A position measuring method using a calculation unit which calculates mark position information relating to a position of a mark by using a mark signal obtained by irradiating a detection beam onto the mark formed on an object, the position measuring method comprising:
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performing filtering processing on the mark signal, and generating a mark signal having a different frequency configuration, comparing a plurality of mark position information calculated by the calculation unit using a plurality of mark signals having different frequency configurations, and evaluating the mark position information, and the calculation unit calculates a final mark position information based on the plurality of mark position information and evaluation results, wherein the filtering processing reduces a proportion within the mark signal of a frequency component greater than a specified frequency, and in a case where the filtering processing is performed a plurality of times on the mark signal, the filtering is performed following an alteration of the frequency component for which a proportion is to be reduced. - View Dependent Claims (46, 47, 48)
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Specification