Method of manufacturing a longitudinal microsolenoid

• US 7,107,668 B2
• Filed: 04/02/2004
• Issued: 09/19/2006
• Est. Priority Date: 04/14/1999
• Status: Expired due to Fees

• Current Assignee: Takashi Nishi
• Original Assignee: Takashi Nishi
• Inventors: Nishi, Takashi
• Primary Examiner(s): Kim, Paul D.
• Application Number:
  US10/817,273
• Publication Number:
  US 20040187295A1
• Time in Patent Office: 900 Days
• Field of Search: 296/06, 296/021, 298/46, 298/47, 427/96, 427/97, 427/116, 427/123, 427/124, 428/3, 428/42, 428/57, 428/98, 216/2, 216/39, 216/49, 216/58, 216/67, 430/313, 430/316, 430/317
• US Class Current: 29/606
• CPC Class Codes: H01F 17/0033 with the coil helically wound around a magnetic core
• CPC Class Codes: H01F 41/041 Printed circuit coils apparatus or processes for manufacturing printed circuits in general H05K3/00
• CPC Class Codes: Y10T 29/4902 Electromagnet, transformer or inductor
• CPC Class Codes: Y10T 29/49073 by assembling coil and core
• CPC Class Codes: Y10T 29/49155 Manufacturing circuit on or in base
• CPC Class Codes: Y10T 29/49156 with selective destruction of conductive paths
• CPC Class Codes: Y10T 428/149 Sectional layer removable
• CPC Class Codes: Y10T 428/19 Sheets or webs edge spliced or joined
• CPC Class Codes: Y10T 428/24 Structurally defined web or sheet [e.g., overall dimension, etc.]

Abstract

A photosensitive material is coated on an insulating material (13) stacked on a substrate (1) (FIG. 16A), and exposed and developed using a mask having a light-shielding film capable of controlling a light transmittance from 100% to 0% annularly and continuously to form a spiral photosensitive material (FIG. 16B). After conducting treatment at a high temperature, the insulating material under the photosensitive material is spirally formed by etching (FIG. 16C). A metal (12) is stacked on the substrate (FIG. 16D), and a photosensitive material is coated (FIG. 16E). The photosensitive material is exposed and developed using a mask having an annular light-shielding film with a light transmittance of 0% to leave the photosensitive material covering only the metal on the base of the spiral structure (FIG. 16F). After treatment at a high temperature is conducted and the metal exposed is etched (FIG. 16G), the photosensitive material is removed (FIG. 16H).

Claims

1. A method of manufacturing a longitudinal

microsolenoid, which comprises

a step A of stacking an insulating material on a substrate, coating a photosensitive material thereon, and exposing and then developing the photosensitive material using a mask C to form a spiral photosensitive material,

a step B of, after said step A, solidifying the photosensitive material by treatment at a high temperature, forming an insulating material under the photosensitive material into a spiral shape by etching, and stacking a metal on the substrate,

a step C of, after said step B, coating a photosensitive material, and exposing and developing the photosensitive material using a mask D to leave the photosensitive material covering only the metal on a base of the spiral structure, and

a step D of, after said step C, conducting high-temperature treatment, etching the metal that is exposed, and then removing the photosensitive material,

said mask C being such that a light-shielding film capable of controlling a light transmittance from 100% to 0% annularly and continuously is provided on a glass through which a light is transmitted by 100%, and such that said mask D has an annular light-shielding film with a light transmittance of 0%.