Method of integrating optical devices and electronic devices on an integrated circuit
First Claim
1. A method for integrating an optical device and an electronic device on a semiconductor substrate, comprising:
- providing a semiconductor substrate having an active semiconductor layer;
forming openings within the active semiconductor layer in a first region of the semiconductor substrate and protecting the active semiconductor layer in a second region of the semiconductor substrate during the formation of openings within the active semiconductor layer in the first region, wherein the first region corresponds to an electronic device portion of the semiconductor substrate and the second region corresponds to an optical device portion of the semiconductor substrate;
filling the openings of the active semiconductor layer in the electronic device portion of the semiconductor substrate with a fill material;
exposing a portion of the active semiconductor layer in the second region of the semiconductor substrate and protecting the first region of the semiconductor substrate during the exposing of the active semiconductor layer in the second region;
epitaxially growing a semiconductor layer overlying the exposed active semiconductor layer in the second region, the epitaxially grown semiconductor layer corresponding to an optical device region;
forming at least a portion of an electronic device on the active semiconductor layer within the electronic device portion of the semiconductor substrate;
forming openings within the epitaxially grown semiconductor layer of the optical device portion of the semiconductor substrate, wherein the openings define one or more features of an optical device; and
forming a further portion of the electronic device within the electronic device portion of the semiconductor substrate.
20 Assignments
0 Petitions
Accused Products
Abstract
A method for integrating an optical device and an electronic device on a semiconductor substrate comprises forming openings within an active semiconductor layer in a first region of the semiconductor substrate, wherein the first region corresponds to an electronic device portion and the second region corresponds to an optical device portion. A semiconductor layer is epitaxially grown overlying an exposed active semiconductor layer in the second region, the epitaxially grown semiconductor layer corresponding to an optical device region. At least a portion of an electronic device is formed on the active semiconductor layer within the electronic device portion of the semiconductor substrate. The method further includes forming openings within the epitaxially grown semiconductor layer of the optical device portion of the semiconductor substrate, wherein the openings define one or more features of an optical device.
41 Citations
37 Claims
-
1. A method for integrating an optical device and an electronic device on a semiconductor substrate, comprising:
-
providing a semiconductor substrate having an active semiconductor layer; forming openings within the active semiconductor layer in a first region of the semiconductor substrate and protecting the active semiconductor layer in a second region of the semiconductor substrate during the formation of openings within the active semiconductor layer in the first region, wherein the first region corresponds to an electronic device portion of the semiconductor substrate and the second region corresponds to an optical device portion of the semiconductor substrate; filling the openings of the active semiconductor layer in the electronic device portion of the semiconductor substrate with a fill material; exposing a portion of the active semiconductor layer in the second region of the semiconductor substrate and protecting the first region of the semiconductor substrate during the exposing of the active semiconductor layer in the second region; epitaxially growing a semiconductor layer overlying the exposed active semiconductor layer in the second region, the epitaxially grown semiconductor layer corresponding to an optical device region; forming at least a portion of an electronic device on the active semiconductor layer within the electronic device portion of the semiconductor substrate; forming openings within the epitaxially grown semiconductor layer of the optical device portion of the semiconductor substrate, wherein the openings define one or more features of an optical device; and forming a further portion of the electronic device within the electronic device portion of the semiconductor substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
-
-
22. A method for integrating an optical device and an electronic device on a semiconductor substrate, comprising:
-
providing a semiconductor substrate having an active semiconductor layer; forming openings within the active semiconductor layer in a first region of the semiconductor substrate and protecting the active semiconductor layer in a second region of the semiconductor substrate during the formation of openings within the active semiconductor layer in the first region, wherein the first region corresponds to an electronic device portion of the semiconductor substrate and the second region corresponds to an optical device portion of the semiconductor substrate; filling the openings of the active semiconductor layer in the electronic device portion of the semiconductor substrate with a fill material; forming at least a portion of an electronic device on the active semiconductor layer within the electronic device portion of the semiconductor substrate; depositing a first dielectric layer and a second dielectric layer overlying the first and second regions of the semiconductor substrate; exposing a portion of the active semiconductor layer in the second region of the semiconductor substrate and protecting the first region of the semiconductor substrate during the exposing of the active semiconductor layer in the second region; epitaxially growing a semiconductor layer overlying the exposed active semiconductor layer in the second region, the epitaxially grown semiconductor layer corresponding to an optical device region; patterning and etching the second dielectric layer to form sidewall spacers on sidewalls of the gate electrode with a portion of the first dielectric layer in-between the gate electrode and the sidewall spacers; forming openings within the epitaxially grown semiconductor layer of the optical device portion of the semiconductor substrate, wherein the openings define one or more features of an optical device; and forming a further portion of the electronic device within the electronic device portion of the semiconductor substrate. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
-
Specification