Architecture for vertical transistor cells and transistor-controlled memory cells
First Claim
1. The vertical transistor architecture, comprising:
- an array of vertical transistor cells formed in a substrate and arranged in a transistor plane, in rows in an x direction, and in columns in a y direction perpendicular to the x direction;
an array of active trenches, wherein the active trenches separate the rows of transistor cells; and
an array of isolation trenches, wherein the isolation trenches separate the columns of transistor cells;
wherein active regions at least of transistor cells which are adjacent to one another in the x direction are connected to one another, whereby a charge carrier transport is made possible between the active regions of transistor cells which are adjacent in the x direction;
wherein the vertical transistor cells comprise;
respective lower source/drain connection region;
respective upper source/drain connection regions arranged above the lower source drain regions;
respective conductive channels disposed between the upper and lower source/drain connection regions; and
respective gate electrodes insulated from the active regions by a gate dielectric;
wherein the active regions are in each case sections of a contiguous layer body, wherein the continuous body is patterned at least by the isolation trenches in an upper region, and wherein the contiguous body in a lower region connects the active regions of transistor cells that are adjacent to one another at least in the x direction;
wherein the vertical transistor architecture further comprises a plurality of layer bodies deposed in the transistor cell array in each case separated from one another by the active trenches.
4 Assignments
0 Petitions
Accused Products
Abstract
In a substrate vertical transistor cells are formed and are arranged, in a transistor cell array, row by row in an x direction and column by column in a y direction. Lower source/drain regions of the transistor cells are connected to a common connection plate. Upper source/drain regions of the transistor cells impart a contact connection for instance to a storage capacitor of a DRAM memory cell. Active trenches running between the transistor cells with word lines are formed along the x direction. The word lines form gate electrodes in sections. A potential at the gate electrode controls a conductive channel in an active region arranged in each case between the upper and the lower source/drain connection region. According to the invention, the active regions of adjacent transistor cells are sections of a contiguous layer body and are connected to one another. An accumulation of charge carriers in the active region and floating body effects are avoided without increasing the area requirement of a transistor cell.
-
Citations
20 Claims
-
1. The vertical transistor architecture, comprising:
-
an array of vertical transistor cells formed in a substrate and arranged in a transistor plane, in rows in an x direction, and in columns in a y direction perpendicular to the x direction; an array of active trenches, wherein the active trenches separate the rows of transistor cells; and an array of isolation trenches, wherein the isolation trenches separate the columns of transistor cells; wherein active regions at least of transistor cells which are adjacent to one another in the x direction are connected to one another, whereby a charge carrier transport is made possible between the active regions of transistor cells which are adjacent in the x direction; wherein the vertical transistor cells comprise; respective lower source/drain connection region; respective upper source/drain connection regions arranged above the lower source drain regions; respective conductive channels disposed between the upper and lower source/drain connection regions; and respective gate electrodes insulated from the active regions by a gate dielectric; wherein the active regions are in each case sections of a contiguous layer body, wherein the continuous body is patterned at least by the isolation trenches in an upper region, and wherein the contiguous body in a lower region connects the active regions of transistor cells that are adjacent to one another at least in the x direction; wherein the vertical transistor architecture further comprises a plurality of layer bodies deposed in the transistor cell array in each case separated from one another by the active trenches. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
-
-
17. A vertical transistor architecture comprising:
-
an array of vertical transistor cells formed in a substrate and arranged in a transistor plane, in rows in an x direction, and in columns in a y direction perpendicular to the x direction; an array of active trenches, wherein the active trenches separate the rows of transistor cells; and an array of isolation Wenches, wherein the isolation trenches separate the columns of transistor cells; wherein active regions at least of transistor cells which are adjacent to one another in the x direction are connected to one another, whereby a charge carrier transport is made possible between the active regions of transistor cells which are adjacent in the x direction; wherein the vertical transistor cells comprise; respective lower source/drain connection region; respective upper source/drain connection regions arranged above the lower source drain regions; respective conductive channels disposed between the upper and lower source/drain connection regions; and respective gate electrodes insulated from the active regions by a gate dielectric; wherein the active regions are in each case sections of a contiguous layer body, wherein the contiguous body is patterned at least by the isolation trenches in an upper region, and wherein the contiguous body in a lower region connects the active regions of transistor cells that are adjacent to one another at least in the x direction; and wherein a connection plate is patterned in an upper region by the active trenches extending along the x axis, wherein the lower source/drain connection regions are formed in the upper region of the connection plate in each case below the active regions, wherein the isolation trenches have a smaller depth than the active trenches, and wherein the layer bodies are formed contiguously row by raw in each in a lower region below the isolation trenches. - View Dependent Claims (18)
-
-
19. A vertical transistor architecture comprising:
-
an array of vertical transistor cells formed in a substrate and arranged in a transistor plane, in rows in an x direction, and in columns in a y direction perpendicular to the x direction; an array of active trenches, wherein the active trenches separate the rows of transistor cells; and an array of isolation trenches, wherein the isolation trenches separate the columns of transistor cells; wherein active regions at least of transistor cells which are adjacent to one another in the x direction are connected to one another, whereby a charge carrier transport is made possible between the active regions of transistor cells which are adjacent in the x direction; wherein the vertical transistor cells comprise; respective lower source/drain connection region; respective upper source/drain connection regions arranged above the lower source drain regions; respective conductive channels disposed between the upper and lower source/drain connection regions; and respective gate electrodes insulated from the active regions by a gate dielectric; wherein the active regions are in each case sections of a contiguous layer body, wherein the contiguous body is patterned at least by the isolation trenches in an upper region, and wherein the contiguous body in a lower region connects the active regions of transistor cells that are adjacent to one another at least in the x direction; and wherein an upper region of a connection plate is patterned in the x direction and in the y direction, wherein a lower source/drain connection region delimited in the x direction and the y direction is in each case formed in the upper region of the connection plate, and wherein the active regions of transistor cells which are adjacent in the x direction and the y direction are formed contiguously by a single layer body which is patterned by the lower source/drain connection regions. - View Dependent Claims (20)
-
Specification