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System for integrating a toroidal inductor in a semiconductor device

  • US 7,109,838 B2
  • Filed: 09/10/2001
  • Issued: 09/19/2006
  • Est. Priority Date: 09/08/2000
  • Status: Active Grant
First Claim
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1. An inductor for an integrated circuit containing at least three metal levels, comprising:

  • (a) a first plurality of conductive traces, said traces formed in a first metal level;

    (b) a second plurality of conductive traces, said traces formed in a second metal level;

    (c) a plurality of vias connecting said first plurality of traces with said second plurality of traces, said traces and vias forming a toroidal coil, wherein said vias extend through a third metal level, said third metal level between said first metal level and said second metal level.

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