Lithographic apparatus, substrate holder and method of manufacturing
First Claim
1. A lithographic projection apparatus comprising:
- a radiation system for providing a projection beam of radiation;
a support structure for supporting a patterning device, said patterning device serving to pattern said projection beam according to a desired pattern to form a patterned beam;
a substrate holder comprising protrusions, each of said protrusions having an extremity, said extremities of said protrusions defining a substantially flat plane of support for supporting a substantially flat substrate, said substrate holder provided with a clamp to provide a pressing force for pressing said substrate against said extremities of said protrusions;
said protrusions in an edge zone of said substrate holder arranged to provide a substantially flat overhanging of said substrate in relation to said pressing force of said clamp; and
a projection system for projecting said patterned beam onto a target portion of said substrate, wherein said protrusions in an off-edge zone of said substrate holder are distributed so as to provide a substantially equal supporting area for said protrusions in said off-edge zone, said supporting area being defined by a Voronoi diagram distribution associated with at least a plurality of said protrusions.
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Accused Products
Abstract
A lithographic projection apparatus including a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder having a plurality of protrusions, the extremities thereof defining a substantially flat plane of support for supporting a substantially flat substrate, the substrate holder provided with the ability to provide a pressing force for pressing the substrate against the extremities of the protrusions, the protrusions in an edge zone of the substrate holder arranged to provide a substantially flat overhanging of the substrate in relation to the pressing force of the pressing means; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus is characterized in that the protrusions in an off-edge zone of the substrate holder are distributed so as to provide a substantial equal supporting area for each protrusion of the plurality of protrusions, the supporting areas being defined by a Voronoi diagram distribution associated to the protrusions. The lithographic apparatus offers a substrate holder with a reduced overlay and focus error.
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Citations
20 Claims
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1. A lithographic projection apparatus comprising:
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a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, said patterning device serving to pattern said projection beam according to a desired pattern to form a patterned beam; a substrate holder comprising protrusions, each of said protrusions having an extremity, said extremities of said protrusions defining a substantially flat plane of support for supporting a substantially flat substrate, said substrate holder provided with a clamp to provide a pressing force for pressing said substrate against said extremities of said protrusions;
said protrusions in an edge zone of said substrate holder arranged to provide a substantially flat overhanging of said substrate in relation to said pressing force of said clamp; anda projection system for projecting said patterned beam onto a target portion of said substrate, wherein said protrusions in an off-edge zone of said substrate holder are distributed so as to provide a substantially equal supporting area for said protrusions in said off-edge zone, said supporting area being defined by a Voronoi diagram distribution associated with at least a plurality of said protrusions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A substrate holder for a lithographic apparatus, comprising:
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protrusions, each of said protrusions having an extremity, said extremities of said protrusions defining a substantially flat plane of support; and a clamp to provide a pressing force for pressing said substrate against said extremities of said protrusions;
said protrusions in an edge zone of said substrate holder arranged to provide a substantially flat overhanging of the substrate in relation to said pressing force,said protrusions in an off-edge zone of said substrate holder being distributed so as to provide a substantially equal supporting area for said protrusions in said off-edge zone, said supporting areas being defined by a Voronoi diagram distribution.
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18. A method of manufacturing a substrate holder for a lithographic apparatus, comprising:
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providing a plate for supporting a substantially flat substrate; distributing a first plurality of supporting protrusions in an off-edge zone of the plate so as to provide a substantial equal supporting area for the first plurality of supporting protrusions, extremities of each protrusion of the first plurality of supporting protrusions defining a substantially flat plane of support; arranging a second plurality of supporting protrusions in an edge zone of the plate so as to provide a substantially flat overhanging of the substrate in relation to a force pressing the substrate against the projections; and calculating a supporting area distribution defined by a Voronoi diagram associated with the protrusions and keeping an area deviation of the supporting area distribution to a minimum. - View Dependent Claims (19, 20)
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Specification