Movable stage system, lithographic apparatus, and device manufacturing method
First Claim
1. A horizontally-oriented movable stage system, comprising:
- a base;
a platform that is movable relative to the base;
a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform; and
a drive mechanism configured to move the platform and the balance mass relative to the base, the drive mechanism comprising;
at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction; and
a drive configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.
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Accused Products
Abstract
A movable stage system capable of operating in a lithographic apparatus, is presented. The movable stage system includes a base, a platform that is movable relative to the base, a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform, and a drive mechanism configured to move the platform and the balance mass relative to the base. The drive mechanism comprises at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction, and a driving device configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.
12 Citations
17 Claims
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1. A horizontally-oriented movable stage system, comprising:
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a base; a platform that is movable relative to the base; a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform; and a drive mechanism configured to move the platform and the balance mass relative to the base, the drive mechanism comprising; at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction; and a drive configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A lithographic apparatus, comprising;
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a radiation system configured to condition a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation; a substrate holder configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a projection system for projecting the patterned beam onto a target portion of the substrate; and a horizontally-oriented positioning apparatus configured to position a first part relative to other parts of the apparatus, the positioning apparatus including; a base; a platform that is movable relative to the base; a balance mass tat is movable relative to the base and is configured to compensate for forces generated by a movement of the platform; a drive mechanism configured, to move the platform and the balance mass relative to the base, the drive mechanism comprising at least one belt transmission that couples the platform and the balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction; and a drive configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass. - View Dependent Claims (13, 14, 15)
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16. A device manufacturing method, comprising:
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providing a substrate that is at least partially covered by a layer of radiation-sensitive material; conditioning a beam of radiation using a radiation system; providing a support configured to support a patterning device; configuring the beam of radiation with a desired pattern in its cross-section based on the patterning device; projecting the patterned bean of radiation onto a target area of the layer of radiation-sensitive material; and positioning at least a first part of the apparatus relative to other parts of the apparatus via a positioning apparatus, the positioning apparatus including a horizontally-oriented movable stage system comprising; a base; a platform that is movable relative to the base; a balance mass that is movable relative to the base and is configured to compensate for forces generated by a movement of the platform; and a drive mechanism configured to move the platform and the balance mass relative to the base, die drive mechanism comprising; at least one belt transmission tat couples the platform and rho balance mass such that when the platform moves along a direction, the balance mass is moved in an at least partially opposite direction; and a drive configured to mechanically engage the balance mass or the platform to directly drive the platform or the balance mass.
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17. A movable stage system, comprising:
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a base; a platform that is movable relative to the base; a first and second balance mass that are movable relative to the base and are elastically coupled to each other, the first and second balance masses being configured to compensate for forces generated by a movement of the platform; and a first and second drive mechanism configured to move the first and second balance masses relative 10 the base, each of the drive mechanisms comprising; at least one belt transmission that couples the platform to an associated balance mass such that when the platform moves along a direction, the associated balance mass moves in an at least partially opposite direction; and a drive configured to mechanically engage the associated balance mass or the platform to directly drive the platform or the balance mass.
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Specification