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System and method for lithography simulation

  • US 7,111,277 B2
  • Filed: 11/04/2004
  • Issued: 09/19/2006
  • Est. Priority Date: 10/07/2003
  • Status: Active Grant
First Claim
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1. A method for evaluating a design pattern on a photolithographic mask, the method comprising:

  • generating a pixel-based bitmap of the design pattern on the photolithographic mask using an image of the photolithographic mask;

    generating a simulated image of the design pattern in wafer resist using (1) the pixel-based bitmap of the design pattern on the photolithographic mask and (2) a relationship representing an imaging path of projection and illumination optics of a photolithographic tool; and

    evaluating the design pattern on the photolithographic mask by comparing the simulated image of the design pattern in wafer resist and a design target on a wafer which corresponds to the design pattern on the photolithographic mask.

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