Method of manufacturing liquid crystal display
First Claim
1. A method of manufacturing a liquid crystal display, comprising the steps of:
- forming a first conductive layer on a substrate;
patterning the first conductive layer to form a gate line with a gate line, a gate electrode and a gate pad;
forming a gate insulating layer, a semiconductor layer, a doped semiconductor layer and a second conductive layer on the gate line;
forming a photoresist pattern with various thicknesses on the second conductive layer, wherein said photoresist pattern is a layer unexposed in a certain thickness over said gate pad and said gate electrode;
providing stepwise etching on said second conductive layer, said doped semiconductor layer, and a portion of said semiconductor layer so as to form a data line with source electrode and a drain electrode;
forming an organic protection layer,patterning said organic protection layer to form a plurality of through holes; and
forming a third conductive layer in said through holes electrically connected to said second conductive layer.
1 Assignment
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Accused Products
Abstract
On a substrate, the pattern of the first conductive layer is defined, that is, a gate line combination including gate pads, scanning lines and gate electrodes. A gate insulating layer, a semiconductor layer, a doped semiconductor layer and a second conductive layer are deposited on the substrate and the above-mentioned gate line combination in sequence. A photoresist layer is overlaid on the second conductive layer. The photoresist layer within the aperture areas is fully exposed. Using a half-tone mask or a slit pattern to make parts of the photoresist layer lying on the gate pads and the gate electrodes are not exposed to its full depth. As a result, the photoresist pattern formed varies in thickness. After being processed with drying etching and wet etching for several times, all the layers previously deposited within the aperture areas can be totally etched and removed. However, as regards the layers deposited on the gate pads and the gate electrodes, etching only takes place in those layers above the semiconductor layer. Then, an organic protection layer is laid on the substrate and the above-mentioned structure, and the holes, which are to function as the passageways for the transparent conductive layer to contact the metallic layer, are defined on the organic protection layer. Then, the gate pads are exposed out of holes above them, using dry etching again. Lastly, the pattern of the transparent conductive layer is defined on the organic protection layer and in the plurality of holes.
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Citations
17 Claims
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1. A method of manufacturing a liquid crystal display, comprising the steps of:
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forming a first conductive layer on a substrate; patterning the first conductive layer to form a gate line with a gate line, a gate electrode and a gate pad; forming a gate insulating layer, a semiconductor layer, a doped semiconductor layer and a second conductive layer on the gate line; forming a photoresist pattern with various thicknesses on the second conductive layer, wherein said photoresist pattern is a layer unexposed in a certain thickness over said gate pad and said gate electrode; providing stepwise etching on said second conductive layer, said doped semiconductor layer, and a portion of said semiconductor layer so as to form a data line with source electrode and a drain electrode; forming an organic protection layer, patterning said organic protection layer to form a plurality of through holes; and forming a third conductive layer in said through holes electrically connected to said second conductive layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of manufacturing a liquid crystal display, comprising the steps of:
- forming a first conductive layer on a substrate;
patterning the first conductive layer to form a gate line with a gate line, a gate electrode and a gate pad;
forming a gate insulating layer and a semiconductor layer on the gate line;
forming an etching stop layer on the semiconductor layer and over the gate electrode;
forming a doped semiconductor layer and a second conductive layer on the etching stop layer and semiconductor layer;
patterning the second conductive layer, doped semiconductor layer, semiconductor layer and gate insulating layer to form a data line with a source electrode and a drain electrode;
forming an organic protection layer;
patterning the organic protection layer so as to form a plurality of through holes;
forming a third conductive layer in the through holes electrically connected to the second conductive layer. - View Dependent Claims (10, 11, 12, 13)
- forming a first conductive layer on a substrate;
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14. A method of manufacturing a liquid crystal display, comprising the steps of:
- forming a first conductive layer on a substrate;
patterning the first conductive layer to form a gate line with a gate line, a gate electrode and a gate pad;
forming a gate insulating layer on the gate line and patterning the gate insulating layer for the gate pad to be exposed;
forming a semiconductor layer, an etching stop layer, a doped semiconductor layer and a second conductive layer on the gate insulating layer and gate line;
patterning the second conductive layer, doped semiconductor layer and semiconductor layer to form a data line, a source electrode and a drain electrode;
forming an organic protection layer;
patterning the organic protection layer to form a plurality of through holes; and
forming a third conductive layer in the through holes electrically connected to the second conductive layer. - View Dependent Claims (15, 16, 17)
- forming a first conductive layer on a substrate;
Specification