Method and apparatus for dynamically measuring the thickness of an object
First Claim
1. An apparatus for dynamically measuring thickness of a test object, comprising:
- an eddy current sensor having first and second sensor heads, said sensor heads positioned substantially opposite each other and defining a predetermined gap therebetween for passage by at least a portion of the test object through said gap, said first and second sensor heads making measurements at one or more sampling locations on said test object when at said gap;
a mechanism for moving the test object through said gap while said measurements are made;
a position sensing mechanism, said position sensing mechanism being used to determine one or more positions of said one or more sampling locations on said test object; and
an evaluation circuit in communication with the eddy current sensor and with the position sensing mechanism, said evaluation circuit being used to determine the thickness of the test object at said one or more sampling locations.
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Abstract
A method and apparatus are provided for measuring the thickness of a test object. The apparatus includes an eddy current sensor having first and second sensor heads. The sensor heads are positioned to have a predetermined gap therebetween for passage by at least a portion of the test object through the gap. The sensor heads make measurements at given sampling locations on the test object as the test object is moved through the gap. The apparatus also includes a position sensing mechanism to determine positions of the sampling locations on the test object. The apparatus also includes an evaluation circuit in communication with the eddy current sensor and to the position sensing mechanism for determining the thickness of the test object at the sampling locations.
42 Citations
45 Claims
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1. An apparatus for dynamically measuring thickness of a test object, comprising:
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an eddy current sensor having first and second sensor heads, said sensor heads positioned substantially opposite each other and defining a predetermined gap therebetween for passage by at least a portion of the test object through said gap, said first and second sensor heads making measurements at one or more sampling locations on said test object when at said gap; a mechanism for moving the test object through said gap while said measurements are made; a position sensing mechanism, said position sensing mechanism being used to determine one or more positions of said one or more sampling locations on said test object; and an evaluation circuit in communication with the eddy current sensor and with the position sensing mechanism, said evaluation circuit being used to determine the thickness of the test object at said one or more sampling locations. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of measuring thickness of a test object, comprising the steps of:
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moving the test object through a gap between two eddy current sensor heads, said two eddy current sensor heads being positioned substantially opposite each other; making on-the-fly measurements at one or more sampling locations on said test object using the eddy current sensor heads as the test object is moved through said gap; determining one or more positions of said one or more sampling locations on said test object; and calculating the thickness of the test object at said one or more sampling locations. - View Dependent Claims (12, 13, 14, 15, 16, 17)
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18. An apparatus for measuring thickness of a conductive layer on a wafer substrate, comprising:
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an eddy current sensor having two substantially opposed sensor heads mounted in said apparatus to have a predetermined gap therebetween for passage by at least a portion of the wafer substrate through said gap, said first and second sensor heads making on-the-fly thickness measurements of said conductive layer at given sampling locations on said wafer substrate as said wafer substrate is passed through said gap; a position sensing mechanism to sense positions of said wafer substrate relative to said sensor heads as said wafer substrate is passed through said gap; a controller connected to the eddy current sensor and to the position sensing mechanism for calculating the thickness of the conductive layer at said sampling locations. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A method of measuring thickness of a conductive layer on a wafer substrate, comprising the steps of:
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making on-the-fly thickness measurements of said conductive layer at multiple sampling locations on said wafer substrate using first and second eddy current sensor heads positioned on substantially opposite sides of said wafer substrate while moving said wafer substrate past said eddy current sensor heads; determining positions of said sampling locations on said wafer substrate; and calculating the thickness of the conductive layer at said sampling locations. - View Dependent Claims (29, 30, 31, 32, 33)
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34. A method of measuring thickness of a test object, comprising the steps of:
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generating magnetic flux on substantially opposite sides of the test object and sensing induced eddy currents on said test object at multiple sampling locations on said test object while the test object is moved relative to a given position; determining positions of said sampling locations; and calculating the thickness of the test object at said sampling locations. - View Dependent Claims (35, 36, 37, 38)
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39. An apparatus for measuring thickness of a test object, comprising:
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means for generating magnetic flux on substantially opposite sides of the test object and for sensing induced eddy currents on said test object at multiple sampling locations on said test object as said test object is moved relative to a given position; means for determining positions of said sampling locations; and means for calculating the thickness of the test object at said sampling locations. - View Dependent Claims (40, 41, 42, 43)
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44. A method of measuring thickness of a test object, comprising the steps of:
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moving the test object using a robotic end effector past an eddy current sensor; making on-the-fly measurements at one or more sampling locations on said test object using the eddy current sensor as the test object is moved past said eddy current sensor wherein said eddy current sensor comprises two eddy current sensor heads positioned substantially opposite each other; determining one or more positions of said one or more sampling locations on said test object; and calculating the thickness of the test object at said one or more sampling locations. - View Dependent Claims (45)
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Specification