Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus
First Claim
1. An assembly for determining at least one of tilt or height of a surface of a substrate in a lithographic apparatus, the assembly comprising:
- a substrate table configured to move said substrate along at least one path that is substantially parallel to a direction of a local tangent on an edge contour of said substrate;
a sensor configured to measure said at least one of tilt or height along said at least one path; and
a memory configured to store measurement data of said sensor for use during a later exposure of said substrate by said lithographic apparatus,wherein said at least one path of the substrate forms an angle with respect to an exposure scanning direction of said lithographic apparatus.
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Accused Products
Abstract
An assembly according to an embodiment of the invention includes a sensor for determining at least one of tilt and height of a surface of a substrate in a lithographic apparatus. The substrate is moveable along at least one path substantially parallel to the surface of the substrate with respect to the sensor. The lithographic apparatus has an exposure scanning direction and the assembly is arranged to move the substrate relative to the sensor along the at least one path and to provide measurement data about the at least one of tilt and height along the at least one path. The assembly includes a memory configured to store the measurement data for use during a later exposure of the substrate by the lithographic apparatus. The at least one path of the substrate is at least partly at an angle to the exposure scanning direction.
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Citations
30 Claims
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1. An assembly for determining at least one of tilt or height of a surface of a substrate in a lithographic apparatus, the assembly comprising:
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a substrate table configured to move said substrate along at least one path that is substantially parallel to a direction of a local tangent on an edge contour of said substrate; a sensor configured to measure said at least one of tilt or height along said at least one path; and a memory configured to store measurement data of said sensor for use during a later exposure of said substrate by said lithographic apparatus, wherein said at least one path of the substrate forms an angle with respect to an exposure scanning direction of said lithographic apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A lithographic projection apparatus comprising:
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a radiation system configured to supply a beam of radiation; a support structure configured to support a patterning structure, said patterning structure configured to pattern said beam of radiation according to a desired pattern; a substrate table configured to support a substrate and to move said substrate along at least one path that is substantially parallel to a direction of a local tangent on an edge contour of said substrate; a projection system constructed and arranged to project the patterned beam of radiation onto a target portion of the substrate, and an assembly for determining at least one of tilt or height of the surface of the substrate in a lithographic projection apparatus, the assembly comprising; a sensor configured to measure said at least one of tilt or height along said at least one path; and a memory configured to store measurement data of said sensor for use during a later exposure of said substrate by said lithographic projection apparatus, wherein said at least one path of the substrate forms an angle with respect to an exposure scanning direction of said lithographic projection apparatus. - View Dependent Claims (11, 12, 13)
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14. A method for determining at least one of tilt or height of a surface of a substrate in a lithographic projection apparatus, the method comprising:
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moving the substrate along at least one path that is substantially parallel to a direction of a local tangent on an edge contour of said substrate; providing measurement data about said at least one of tilt or height along said at least one path; and storing said measurement data in a memory for use during a later exposure of said substrate by said lithographic projection apparatus, wherein said at least one path of said substrate forms an angle with respect to an exposure scanning direction of said lithographic projection apparatus. - View Dependent Claims (15, 16, 17, 18, 19)
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20. An assembly for determining at least one of tilt or height of a surface of a substrate in a lithographic apparatus, the assembly comprising;
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a substrate table configured to move said substrate along at least one path that is substantially parallel to a direction of a local tangent on an edge contour of said substrate; a sensor configured to measure said at least one of tilt or height along said at least one path, said sensor including a plurality of sensing spots; and a memory configured to store measurement data of said sensor for use during a later exposure of said substrate by said lithographic apparatus, wherein said sensor is configured to measure said at least one of tilt or height with a predetermined subset of the plurality of sensing spots when one or more sensing spots are directed on or outside an edge contour of said substrate, and wherein said at least one path of said substrate forms an angle with respect to an exposure scanning direction of said lithographic projection apparatus.
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21. An assembly for determining at least one of tilt or height of a surface of a substrate in a lithographic apparatus, comprising:
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a substrate table configured to move said substrate along at least two paths that are substantially parallel to a direction of a local tangent on an edge contour of said substrate; and a sensor configured to measure said at least one of tilt or height along each of said at least two paths, wherein the direction of each of said at least two paths of the substrate is substantially parallel to the direction of the local tangent to a portion of an edge contour of said substrate proximate to said path, and wherein said at least two paths are contiguous and form an angle with respect to each other. - View Dependent Claims (22, 23, 24)
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25. A lithographic apparatus comprising:
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a table configured to move a substrate along a path that is substantially parallel to a direction of a local tangent on an edge contour of the substrate and forms an angle with respect to an exposure scanning direction of the lithographic apparatus; and a sensor configured to measure at least one of a height or a tilt of the substrate at each of at least three different positions of the substrate table along the path, wherein movement of the substrate table from each of the at least three positions to a subsequent position includes movement along both of a first axis substantially parallel to the exposure scanning direction and a second axis substantially parallel to the direction of the local tangent on the edge contour of the substrate and forming an angle with respect to the first axis. - View Dependent Claims (26, 27, 28, 29, 30)
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Specification