Lithographic apparatus

• US 7,113,258 B2
• Filed: 09/14/2004
• Issued: 09/26/2006
• Est. Priority Date: 01/15/2001
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Shafer, Edwin Ross, Lof, Joeri, Van Buel, Henricus Wilhelmus Maria, Consolini, Joseph J., Best, Keith Frank
• Primary Examiner(s): Kim, Peter B.
• Application Number:
  US10/939,999
• Publication Number:
  US 20050140951A1
• Time in Patent Office: 742 Days
• Field of Search: 355/53, 355/67, 355/72, 355/75, 355/77, 355/30, 356/399, 356/400, 356/401, 438/401, 359/380, 359/886, 430/20, 430/320, 250/492.2
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70691 Handling of masks or workpieces
• CPC Class Codes: G03F 9/7084 Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels

Abstract

A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system. The lithographic projection apparatus is further provided with immersion system for providing a fluid between the lens and the substrate.

Claims

1. A lithographic projection apparatus comprising:

a support structure for supporting a patterning device, the patterning device serving to pattern a beam of radiation according to a desired pattern;

a substrate table for holding a substrate, the substrate having a first side and a second side;

a projection system for imaging the patterned beam onto a target portion on a first side of the substrate, while the second side of the substrate faces the substrate table;

an alignment system for aligning a pattern of the patterning device with an alignment mark provided on the substrate, using alignment radiation;

a fluid system constructed and arranged to allow a fluid to be present between the projection system and the substrate;

an optical system for providing an image of said alignment mark for use by the alignment system, said optical system being constructed and arranged to direct the aligmnent radiation via the second side of the substrate, and

a processor arranged to control said alignment system and to control a fluid supply of the fluid system such that said aligning is performed while said fluid supply supplies fluid between the projection system and the substrate.

2. Apparatus according to claim 1, wherein said optical system is arranged to provide an image of said alignment mark at the plane of the first side of the substrate.

3. Apparatus according to claim 1, wherein said optical system comprises an optical system for providing a plurality of images, each corresponding to a respective one of a plurality of alignment marks.

4. Apparatus according to claim 1, wherein said optical system comprises at least two mirrors and lenses.

5. Apparatus according to claim 1, wherein said optical system comprises at least one optical fiber.

6. Apparatus according to claim 1, wherein the optical system is arranged to provide the alignment mark image displaced laterally from the corresponding alignment mark and beyond the periphery of the area to be occupied by the substrate.

7. Apparatus according to claim 1, wherein said alignment mark is on the second side of the substrate.

8. Apparatus according to claim 7, wherein said alignment system is embodied to perform alignment using a reference mark provided on the first side of the substrate as well as using said alignment mark image provided by said optical system.

9. Apparatus according to claim 1, wherein:

said alignment mark is on the first side of the substrate;

said alignment radiation is substantially transmissible through the material of said substrate; and

said optical system directs said alignment radiation to the alignment mark through the substrate.

10. Apparatus according to claim 9, wherein the alignment radiation comprises infra-red radiation.

11. Apparatus according to claim 1, wherein the alignment radiation and the projection beam have substantially the same wavelength.

12. Apparatus according to claim 1, wherein the fluid system is arranged to provide fluid between only part of the lens and the substrate, such that part of the lens facing the substrate is substantially free from the fluid and where the optical system is arranged to direct the alignment radiation through the lens via the part of the lens that is substantially free from water.

13. Apparatus according to claim 1, wherein the fluid system is arranged such that the entire substrate is covered by the fluid.

14. Device manufacturing method comprising:

projecting a patterned beam of radiation through a fluid and onto a first side of a substrate, using a patterning device, while a second side of said substrate faces a supporting substrate table;

aligning a pattern of the patterning device with an image of an alignment mark provided on the substrate; and

imaging said alignment mark by directing alignment radiation via the second side of the substrate,

wherein said aligning is performed while said fluid is between a projection system of a lithographic apparatus used in the method and the substrate.

15. Method according to claim 14, further comprising:

turning over the substrate so that said first side and said second side are swapped; and

repeating the alignment.

16. Method according to claim 14, wherein a projection system of a lithographic apparatus used in the method has a front surface facing said substrate and the fluid is provided to only part of the front surface, leaving part of the front surface essentially free from fluid and further comprising:

directing the alignment radiation via the second side of the substrate and via the part of the front surface being essentially free from fluid.

17. A method according to claim 14, wherein the fluid comprises water.

18. A lithographic projection apparatus comprising:

a support structure for supporting a patterning device, the patterning device serving to pattern a beam of radiation according to a desired pattern;

a substrate table for holding a substrate, the substrate having a first side and a second side;

a projection system for imaging the patterned beam onto a target portion on a first side of the substrate, while the second side of the substrate faces the substrate table;

an alignment system, located on a same side of the substrate as the projection system, for aligning a pattern of the patterning device with an alignment mark provided on the substrate, using alignment radiation;

a fluid system constructed and arranged to allow a fluid to be present between the projection system and the substrate; and

an optical system for providing an image of said alignment mark for use by the alignment system, said optical system being constructed and arranged to direct the alignment radiation via the second side of the substrate,

wherein said alignment system and said fluid system are constructed and arranged such that the aligning of said pattern is performed while said fluid system supplies fluid between the projection system and the substrate.