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Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

  • US 7,115,887 B1
  • Filed: 03/15/2005
  • Issued: 10/03/2006
  • Est. Priority Date: 03/15/2005
  • Status: Expired due to Fees
First Claim
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1. A device for generating/producing extremely short-wave ultraviolet electromagnetic wave radiation, comprising:

  • a wave front zone;

    a plasma generating gas within the wave front zone;

    a first plasma accelerator source having an anode and a cathode thereby being adapted to form a first plasma generating zone and producing a first plasma beam;

    a second plasma accelerator source having a second anode and a second cathode thereby being adapted to form a second plasma generating zone and producing a second plasma beam;

    wherein the second plasma beam intersects the first plasma beam within the wave front zone at an angle of intersection {acute over (α

    )}, wherein the angle {acute over (α

    )} is from 90°

    to 180° and

    the intersecting plasma beams within the wave front zone emits electromagnetic radiation at a wavelength from about 10 nm to about 20 nm.

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