Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
First Claim
Patent Images
1. A lithographic apparatus comprising:
- a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and
a measurement system having at least one catoptrical system, wherein the catoptrical system includes two or more reflective elements and wherein said measurement system is configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using a measurement beam having an optical path that traverses the at least one catoptrical system, wherein said at least one catoptrical system is configured to perform an imaging function of at least one dioptrical element.
1 Assignment
0 Petitions
Accused Products
Abstract
A lithographic projection apparatus according to an embodiment of the invention includes a measurement system configured to determine a position of a target portion of a substrate, using at least one among an optical sensing operation and an optical detecting operation. The position is determined via an optical path that includes at least one catoptrical system arranged to have an imaging function of at least one dioptrical element.
53 Citations
30 Claims
-
1. A lithographic apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and a measurement system having at least one catoptrical system, wherein the catoptrical system includes two or more reflective elements and wherein said measurement system is configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using a measurement beam having an optical path that traverses the at least one catoptrical system, wherein said at least one catoptrical system is configured to perform an imaging function of at least one dioptrical element. - View Dependent Claims (2, 3, 4, 5)
-
-
6. A lithographic apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and a measurement system having at least one catoptrical system, wherein the catoptrical system includes two or more reflective elements and wherein said measurement system is configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using a measurement beam having an optical path that traverses the at least one catoptrical system, wherein said at least one catoptrical system is configured to perform an imaging function of a dioptrical arrangement that includes at least one among a convex lens, a concave lens, a planoconvex lens, and a planoconcave lens.
-
-
7. A lithographic apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and a measurement system having at least one catoptrical system, wherein the catoptrical system includes two or more reflective elements and wherein said measurement system is configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using a measurement beam having an optical path that traverses the at least one catoptrical system, wherein the at least one catoptrical system includes at least one among a concave mirror and a convex mirror.
-
-
8. A lithographic projection apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and a measurement system configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using at least one among an optical sensing operation and an optical detecting operation, wherein the measurement system is configured to determine the position via a measurement beam that traverses an optical path that includes at least one catoptrical system, wherein the catoptrical system include two or more reflective elements, wherein the catoptrical system is arranged to have an imaging function of at least one dioptrical element. - View Dependent Claims (9)
-
-
10. A lithographic projection apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and a measurement system configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using at least one among an optical sensing operation and an optical detecting operation, wherein the measurement system is configured to determine the position via a measurement beam that traverses an optical path that includes at least one catoptrical system, wherein the catoptrical system include two or more reflective elements, wherein said at least one catoptrical system is configured to perform an imaging function of a dioptrical arrangement that includes at least one among a convex lens, a concave lens, a planoconvex lens, and a planoconcave lens.
-
-
11. A lithographic projection apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and a measurement system configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using at least one among an optical sensing operation and an optical detecting operation, wherein the measurement system is configured to determine the position via a measurement beam that traverses an optical path that includes at least one catoptrical system, wherein the catoptrical system include two or more reflective elements, wherein the at least one catoptrical system includes at least one among a concave mirror and a convex mirror.
-
-
12. A lithographic apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a sub substrate; and a level sensor that includes at least one catoptrical system, wherein the catoptrical system includes two or more reflective elements, wherein the level sensor is configured to determine a height of a surface of the substrate using a beam that traverses an optical path that includes the at least one catoptrical system, and wherein the at least one catoptrical system is configured to perform an imaging function of at least one dioptrical element. - View Dependent Claims (13, 14, 15, 16)
-
-
17. A device manufacturing method, said method comprising:
-
projecting a patterned beam of radiation onto a target portion of a substrate; and using at least one of an optical detection action and an optical sensing action to position the target portion of the substrate relative to a focus position of the patterned beam of radiation, wherein the at least one optical detection action and the optical sensing action is performed using a beam that traverses an optical path that includes at least one catoptrical system, wherein the catoptrical system includes two or more reflective elements, wherein the at least one catoptrical system is configured to perform an imaging function of at least one dioptrical element. - View Dependent Claims (18, 19, 20, 21, 22, 23)
-
-
24. A device manufacturing method, said method comprising:
-
projecting a patterned beam of radiation onto a target portion of a substrate; and using a measurement system to position the target portion relative to a focus position of the patterned beam of radiation, wherein the measurement system uses a beam that traverses an optical path that includes at least one catoptrical system and wherein the catoptrical system includes two or more reflective elements, and wherein the at least one catoptrical system is configured to perform an imaging function of at least one dioptrical element. - View Dependent Claims (25, 26, 27, 28)
-
-
29. A lithographic apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and a measurement system having at least two catoptrical systems, wherein the at least two catoptrical systems include two or more reflective elements, wherein said measurement system is configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using a measurement beam having an optical path that traverses the at least two catoptrical systems, and wherein at least one of said at least two catoptrical systems is configured to perform an imaging function of at least one dioptrical element.
-
-
30. A lithographic apparatus comprising:
-
a projection system configured to project a patterned beam of radiation onto a target portion of a substrate; and a measurement system having at least two catoptrical systems, wherein at least one of the two catoptrical systems includes two or more reflective elements and wherein said measurement system is configured to determine a position of the target portion of the substrate relative to a focus plane of the projection system using a measurement beam having an optical path that traverses the at least two catoptrical systems, and wherein the at least one of the two catoptrical systems is configured to perform an imaging function of at least one dioptrical element.
-
Specification