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Lithographic apparatus and device manufacturing method

  • US 7,116,403 B2
  • Filed: 06/28/2004
  • Issued: 10/03/2006
  • Est. Priority Date: 06/28/2004
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus, comprising:

  • an illumination system that supplies a beam of radiation;

    a beam splitter that splits the beam into a first beam and a second beam;

    a first array of individually controllable elements that patterns the first beam with a first pattern;

    a second array of individually controllable elements that patterns the second beam with a second pattern;

    first and second quarter wave plates located between the beam splitter and respective ones of the first and second arrays of individually controllable elements that change a polarization of respective ones of the first and second beams;

    a beam combiner that combines the first and second patterned beams to form a combined patterned beam; and

    a system that projects the combined patterned beam onto a target portion of a substrate,wherein a first portion of the combined patterned beam derived from the first patterned beam is substantially linearly polarized, andwherein a second portion of the combined patterned beam derived from the second patterned beam is substantially linearly polarized, substantially orthogonal to the first portion.

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