Method and system for scheduling maintenance procedures based upon workload distribution

• US 7,120,511 B1
• Filed: 08/11/2004
• Issued: 10/10/2006
• Est. Priority Date: 08/11/2004
• Status: Active Grant

• Current Assignee: Advanced Micro Devices, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Tanzer, Troy Anthony, Weaver, Elizabeth
• Primary Examiner(s): Von Buhr, Maria N.
• Application Number:
  US10/915,883
• Time in Patent Office: 790 Days
• Field of Search: 700 95- 97, 700 99-102, 700117-121
• US Class Current: 700/100
• CPC Class Codes: G06Q 10/06 Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling

Abstract

The present invention is generally directed to various methods and systems for scheduling maintenance procedures based upon workload distribution. In one illustrative embodiment, the method includes providing a tool, identifying a planned processing schedule for processing a plurality of wafer lots in the tool, and providing a controller that schedules a time for a maintenance procedure to be performed on the tool based upon the planned processing schedule of the plurality of wafer lots.

Claims

1. A method, comprising:

providing a tool;

identifying a planned processing schedule for processing a plurality of wafer lots in said tool;

providing a controller that schedules a time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots by identifying a number of potential conflicts between the maintenance procedure and the processing of said wafer lots at a plurality of times and selecting one of the times for scheduling the maintenance procedure based on the number of potential conflicts at the associated times.

2. The method of claim 1, further comprising performing said maintenance procedure on said tool at said scheduled time.

3. The method of claim 1, wherein said tool comprises at least one of an etch tool, a deposition tool, an ion implant tool, a photolithography module, a stepper, a furnace, a chemical mechanical planarization tool and a metrology tool.

4. The method of claim 1, wherein said processing of said plurality of wafer lots comprises performing at least one of a metrology process, a deposition process, an etching process, an ion implantation process, a heating process and a chemical mechanical planarization process.

5. The method of claim 1, wherein scheduling said time for said maintenance procedure comprises changing a previously selected time for said maintenance procedure.

6. The method of claim 1, wherein providing a controller that schedules a time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots comprises:

identifying a time-wise gap in said planned processing schedule for said plurality of wafer lots wherein said lots are not scheduled to be processed in said tool; and

scheduling said maintenance procedure to be performed in said time-wise gap in said planned processing schedule.

7. The method of claim 1, wherein providing a controller that schedules a time for a maintenance procedure to be performed on said processing tool based upon said planned processing schedule of said plurality of wafer lots comprises delaying performance of a previously scheduled maintenance procedure based upon said planned processing schedule of said plurality of wafer lots.

8. The method of claim 1, wherein providing a controller that schedules a time for a maintenance procedure to be performed on said processing tool based upon said planned processing schedule of said plurality of wafer lots comprises advancing performance of a previously scheduled maintenance procedure based upon said planned processing schedule of said plurality of wafer lots.

9. The method of claim 1, wherein providing a controller that schedules a time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots comprises providing a controller that schedules a time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots subject to a requirement that said maintenance procedure be performed on said tool after said tool has been in production service for a specified period of time.

10. The method of claim 1, wherein providing a controller that schedules a time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots comprises providing a controller that schedules a time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots subject to a requirement that said maintenance procedure be performed on said tool after a specified number of wafer lots have been processed through said tool.

11. The method of claim 1, wherein providing a controller that schedules a time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots comprises providing a controller that schedules a time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots wherein said scheduled time cannot extend outside of an allowable range relative to a previously scheduled time for performance of said maintenance procedure.

12. The method of claim 1, further comprising processing additional wafer lots in said tool.

13. A method, comprising:

providing a tool;

identifying a planned processing schedule for processing a plurality of wafer lots in said tool;

providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots, wherein the controller identifies a number of potential conflicts between the maintenance procedure and the processing of said wafer lots at the previously scheduled time and at a plurality of other times and selects one of the other times having fewer potential conflicts than the previously scheduled time; and

performing said maintenance procedure on said tool at said changed time.

14. The method of claim 13, wherein providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said processing tool based upon said planned processing schedule of said plurality of wafer lots comprises delaying performance of a previously scheduled maintenance procedure based upon said planned processing schedule of said plurality of wafer lots.

15. The method of claim 13, wherein providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said processing tool based upon said planned processing schedule of said plurality of wafer lots comprises advancing performance of a previously scheduled maintenance procedure based upon said planned processing schedule of said plurality of wafer lots.

16. The method of claim 13, wherein providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots comprises providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots subject to a requirement that said maintenance procedure be performed on said tool after said tool has been in production service for a specified period of time.

17. The method of claim 13, wherein providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots comprises providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots subject to a requirement that said maintenance procedure be performed on said tool after a specified number of wafer lots have been processed through said tool.

18. The method of claim 13, wherein providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots comprises providing a controller that changes a previously scheduled time for a maintenance procedure to be performed on said tool based upon said planned processing schedule of said plurality of wafer lots wherein said changed time cannot extend outside of an allowable range relative to said previously scheduled time for performance of said maintenance procedure.

19. The method of claim 13, further comprising processing additional wafer lots in said tool.