Electrostatic RF MEMS switches

• US 7,122,942 B2
• Filed: 09/29/2004
• Issued: 10/17/2006
• Est. Priority Date: 08/20/2002
• Status: Expired due to Fees

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Kim, Young-il, Nam, Kuang-woo, Lee, Moon-chul, Song, In-sang, Hong, Young-tack, Shim, Dong-ha, Park, Sun-hee
• Primary Examiner(s): Dougherty, Thomas M.
• Application Number:
  US10/951,612
• Publication Number:
  US 20050040486A1
• Time in Patent Office: 748 Days
• Field of Search: 310/328, 310/330
• US Class Current: 310/328
• CPC Class Codes: H01H 2057/006 Micromechanical piezoelectric relay
• CPC Class Codes: H01H 57/00 Electrostrictive relays; Piezoelectric relays
• CPC Class Codes: H01H 59/0009 making use of micromechanics
• CPC Class Codes: H01P 1/127 Strip line switches

Abstract

A micro switch having a dielectric layer having a movement region formed on a substrate, a conductive layer formed on a predetermined portion of the movement region, a dielectric film formed on the conductive layer, first and second electric conductors formed a predetermined distance above the dielectric film, one or two lower electrodes formed on the movement region, and one or two upper electrodes formed a predetermined distance above the two lower electrodes, the one or two upper electrodes moving the conductive layer and the dielectric film upwards when an electrostatic force occurs between the upper and lower electrodes, and capacitively coupled with the first and second electric conductors to allow a current to flow between the first and second electric conductors. Such a micro switch has a high on/off ratio and isolation degree and a simple structure, and can be fabricated in a very easy process.

Claims

1. A micro switch, comprising:

a substrate;

a dielectric layer formed on the substrate, the dielectric layer having a movement region formed of a predetermined portion of the dielectric layer that is capable of moving up and down by a hinge part formed on one side of the movement region;

a conductive layer formed on a predetermined portion of the movement region;

first and second electric conductors formed a predetermined distance above the conductive layer;

a piezoelectric layer formed on the movement region, causing the conductive layer to move upwards by the supply of a predetermined voltage, and resistively coupled with the first and second electric conductors to allow a current signal to flow between the first and second electric conductors; and

a dielectric film formed on the conductive layer.

2. The micro switch as claimed in claim 1, wherein a portion of the substrate positioned under the movement region, a portion of the dielectric layer surrounding the movement region except where the hinge part is formed, and a portion of the substrate positioned under a portion of the dielectric layer surrounding the movement region, are selectively etched to provide an etched region for allowing the movement region to move up and down.

3. The micro switch as claimed in claim 1, wherein the piezoelectric layer is formed between the conductive layer and the hinge part.

4. The micro switch as claimed in claim 1, further comprising anchors respectively supporting the electric conductors, signal terminals applying signals to the electric conductors, and piezoelectric electrode terminals applying a voltage to the piezoelectric layer.

5. The micro switch as claimed in claim 4, wherein any of the conductive layer, the electric conductors, the anchors, the signal terminals and the piezoelectric electrode terminals is formed of one, or a combination of more than one selected from the group consisting of Au, Ag, Cu, Pt and Rd.

6. A micro switch, comprising:

a substrate;

a dielectric layer formed on the substrate, the dielectric layer having a movement region formed of a predetermined portion of the dielectric layer that is capable of moving up and down by a hinge part formed on one side of the movement region;

a conductive layer formed on a predetermined first portion of the movement region;

first and second electric conductors formed a predetermined distance above the conductive layer; and

a piezoelectric layer formed on a second portion of the movement region, causing the conductive layer to move upwards by the supply of a predetermined voltage, and resistively coupled with the first and second electric conductors to allow a current signal to flow between the first and second electric conductors, wherein the second portion of the movement region corresponds to a portion of the movement region other than the predetermined first portion of the movement region.

7. The micro switch as claimed in claim 6, wherein a portion of the substrate positioned under the movement region, a portion of the dielectric layer surrounding the movement region except where the hinge part is formed, and a portion of the substrate positioned under a portion of the dielectric layer surrounding the movement region, are selectively etched to provide an etched region for allowing the movement region to move up and down.

8. The micro switch as claimed in claim 6, wherein the piezoelectric layer is formed between the conductive layer and the hinge part.

9. The micro switch as claimed in claim 6, further comprising anchors respectively supporting the electric conductors, signal terminals applying signals to the electric conductors, and piezoelectric electrode terminals applying a voltage to the piezoelectric layer.

10. The micro switch as claimed in claim 9, wherein any of the conductive layer, the electric conductors, the anchors, the signal terminals and the piezoelectric electrode terminals is formed of one, or a combination of more than one selected from the group consisting of Au, Ag, Cu, Pt and Rd.

11. A micro switch, comprising:

a substrate having a recessed portion;

a dielectric layer formed on the substrate, the dielectric layer having a protruding movement region that protrudes from a non-movement region of the dielectric layer, the protruding movement region being connected to the non-movement region via a pivoting means provided between the non-movement region and the protruding movement region of the dielectric layer, the protruding movement region protruding from the non-movement region and extending over the recessed portion of the substrate such that the protruding movement region is free to pivot about the pivoting means;

a conductive layer formed on a predetermined portion of the protruding movement region;

first and second electric conductors formed a predetermined distance above the conductive layer; and

a piezoelectric layer formed on the protruding movement region, causing the conductive layer to move upwards by the supply of a predetermined voltage, and resistively coupled with the first and second electric conductors to allow a current signal to flow between the first and second electric conductors.

12. The micro switch as claimed in claim 11, wherein the pivoting means is a portion of the dielectric layer continuously extending between the non-movement region and the protruding movement region of the dielectric layer.

13. The micro-switch as claimed in claim 11, wherein the piezoelectric layer overlaps a portion of the protruding movement region other than a portion of the protruding movement region that the conductive layer overlaps.