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Method and apparatus for the monitoring and control of a semiconductor manufacturing process

  • US 7,123,980 B2
  • Filed: 03/23/2005
  • Issued: 10/17/2006
  • Est. Priority Date: 09/30/2002
  • Status: Active Grant
First Claim
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1. An Advanced Process Control (APC) system for controlling a processing tool in a semiconductor processing environment, the APC system comprising:

  • an APC server providing a plurality of APC related applications;

    an Interface Server (IS) coupled to the APC server;

    a database coupled to the IS and APC server; and

    a graphical user interface (GUD component coupled to the APC server,wherein the IS comprises means for coupling to a plurality of process modules, means for coupling to a plurality of sensors, and means for coupling to the processing tool that comprises a tool agent in the processing tool and an agent client in the APC system, the agent client including an agent client communication class and a driver.

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