Dummy fill for integrated circuits
First Claim
1. A method comprisinggenerating a strategy for placing dummy fill features within a design of an integrated circuit that is to be fabricated using a fabrication process flow that includes an electrochemical deposition or electrochemical mechanical deposition fabrication process,the generation of a strategy for the placing of dummy fill features being based on(a) dimensional or geometric characteristics of features or patterns within the integrated circuit design, and(b) topography or thickness of dummy fill and/or non-dummy fill features determined using a pattern-dependent model that characterizes interactions between (i) the dimensional or geometric characteristics of features or patterns within the integrated circuit design and (ii) dimensional or geometric characteristics of features or patterns within the integrated circuit that would result from the electrochemical deposition or electrochemical mechanical deposition fabrication process.
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Accused Products
Abstract
A method and system are described to reduce process variation as a result of the electrochemical deposition (ECD), also referred to as electrochemical plating (ECP), and chemical mechanical polishing (CMP) processing of films in integrated circuit manufacturing processes. The described methods use process variation and electrical impact to direct the insertion of dummy fill into an integrated circuit.
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Citations
84 Claims
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1. A method comprising
generating a strategy for placing dummy fill features within a design of an integrated circuit that is to be fabricated using a fabrication process flow that includes an electrochemical deposition or electrochemical mechanical deposition fabrication process, the generation of a strategy for the placing of dummy fill features being based on (a) dimensional or geometric characteristics of features or patterns within the integrated circuit design, and (b) topography or thickness of dummy fill and/or non-dummy fill features determined using a pattern-dependent model that characterizes interactions between (i) the dimensional or geometric characteristics of features or patterns within the integrated circuit design and (ii) dimensional or geometric characteristics of features or patterns within the integrated circuit that would result from the electrochemical deposition or electrochemical mechanical deposition fabrication process.
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2. A method comprising
based on an electrical impact analysis and a pattern dependent model of an electrochemical deposition or electrochemical mechanical deposition fabrication process, generating a strategy for placement of dummy fill in a layout for a device to be subjected to the fabrication process, and using the pattern dependent model of the fabrication process and the electrical impact analysis to evaluate expected results of the dummy fill to be placed, the use of the pattern dependent model and the electrical impact analysis being embedded as part of the generation of the dummy fill placement strategy, the pattern-dependent model being based on: -
(a) dimensional or geometric characteristics of features or patterns within an integrated circuit design, and (b) topography or thickness of dummy fill and/or non-dummy fill features determined using a pattern-dependent model that characterizes interactions between (i) the dimensional or geometric characteristics of features or patterns within the integrated circuit design and (ii) dimensional or geometric characteristics of features or patterns within the integrated circuit that would result from the electrochemical deposition or electrochemical mechanical deposition fabrication process.
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3. A method comprising
based on an electrical impact analysis and a pattern dependent model of an electrochemical deposition or electrochemical mechanical deposition fabrication process, generating a strategy for placement of dummy fill in a layout for a device to be subjected to the fabrication process, and using the pattern dependent model of the fabrication process and the electrical impact analysis to evaluate expected results of the dummy fill to be placed, the pattern-dependent model based on: -
(a) dimensional or geometric characteristics of features or patterns within an integrated circuit design, and (b) topography or thickness of dummy fill and/or non-dummy fill features computed using a pattern-dependent model that characterizes interactions between (i) the dimensional or geometric characteristics of features or patterns within the integrated circuit design and (ii) dimensional or geometric characteristics of features or patterns within the integrated circuit that would result from the electrochemical deposition or electrochemical mechanical deposition fabrication process.
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4. A method comprising
based on a pattern dependent model of an electrochemical deposition or electrochemical mechanical deposition fabrication process, generating a strategy for placement of dummy fill in a layout for a device to be subjected to the fabrication process, and using the pattern dependent model of the fabrication process to evaluate expected results of the dummy fill to be placed, wherein the fabrication process for which the strategy is being generated comprises two or more stages of fabrication, the pattern-dependent model being based on (a) dimensional or geometric characteristics of features or patterns within an integrated circuit design, and (b) topography or thickness of dummy fill and/or non-dummy fill features computed using a pattern-dependent model that characterizes interactions between (i) the dimensional or geometric characteristics of features or patterns within the integrated circuit design and (ii) dimensional or geometric characteristics of features or patterns within the integrated circuit that would result from the electrochemical deposition or electrochemical mechanical deposition fabrication process.
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81. A method comprising generating a strategy for placing dummy fill to compensate for pattern dependencies in an electrochemical mechanical deposition fabrication process.
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82. A method comprising
based on electrical impact analysis and a pattern dependent model of an electrochemical mechanical deposition fabrication process, generating a strategy for placement of dummy fill in a layout for a device to be subjected to the fabrication process, and using the pattern dependent model of the fabrication process and the electrical impact analysis to evaluate the expected results of the dummy fill to be placed, the use of the pattern dependent model and the electrical impact analysis being embedded as part of the generation of the dummy fill placement strategy.
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83. A method comprising
based on an electrical impact analysis and a pattern dependent model of an electrochemical mechanical deposition fabrication process, generating a strategy for placement of dummy fill in a layout for a device to be subjected to the fabrication process, and using the pattern dependent model of the fabrication process and the electrical impact analysis to evaluate expected results of the dummy fill to be placed.
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84. A method comprising
based on a pattern dependent model of an electrochemical mechanical deposition fabrication process, generating a strategy for placement of dummy fill in a layout for a device to be subjected to the fabrication process, and using pattern dependent model of the fabrication process to evaluate the expected results of the dummy fill to be placed, the fabrication process for which the strategy is being generated comprising two or more stages of fabrication.
Specification