Lithographic apparatus and device manufacturing method

• US 7,126,672 B2
• Filed: 12/27/2004
• Issued: 10/24/2006
• Est. Priority Date: 12/27/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Tinnemans, Patricius Aloysius Jacobus, Baselmans, Johannes Jacobus Matheus, Jorritsma, Laurentius Catrinus
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/020,642
• Publication Number:
  US 20060139600A1
• Time in Patent Office: 666 Days
• Field of Search: 355/53, 355 67- 71, 430/5, 430/20, 430/30, 359/224
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70466 Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature stitching G03F7/70475
• CPC Class Codes: G03F 7/70475 Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose

Abstract

A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus also includes a data-path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate. The data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern. The point-spread function matrix includes information about the shape and relative position of the point-spread function of each spot to be exposed on the substrate by one of the sub-beams of radiation at a given time.

Claims

1. A lithography apparatus, comprising:

a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation;

an array of individually controllable elements configured to modulate said sub-beams of radiation; and

a data path including at least one data manipulation device arranged to at least partly convert data defining a requested pattern to a control signal suitable for controlling said array of individually controllable elements to form substantially said requested pattern on said substrate,

wherein said at least one data manipulation device is arranged to carry out the conversion by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing said requested pattern, said point-spread function matrix including information about the shape and relative position of the point-spread function of spots to be exposed on said substrate by one of said sub-beams of radiation at a given time.

2. The lithography apparatus of claim 1, wherein said pseudo-inverted matrix is of a type obtained by singular value decomposition of said point-spread function matrix.

3. The lithographic apparatus of claim 2, wherein singular values of said point-spread function matrix with a magnitude less than a threshold magnitude are excluded prior to inversion.

4. The lithography apparatus of claim 3, wherein said threshold magnitude is equal to about 10% of the amplitude of a maximum singular value.

5. The lithography apparatus of claim 1, wherein said column vector represents said requested pattern as defined at a plurality of grid positions on said substrate.

6. A device manufacturing method, comprising:

projecting a beam of radiation onto a substrate as an array of sub-beams of radiation;

modulating the sub-beams of radiation with an array of individually controllable elements; and

executing at a data manipulation device in a data path at least partial conversion of data defining a requested pattern to a control signal suitable for controlling the array of individually controllable elements to form substantially the requested pattern on the substrate,

wherein the at least partial conversion of data is carried out by applying a pseudo-inverted form of a point-spread function matrix to a column vector representing the requested pattern, the point-spread function matrix including information about the shape and relative position of the point-spread function of spots to be exposed on the substrate by one of the sub-beams of radiation at a given time.

7. The device manufacturing method of claim 6, wherein the pseudo-inverted matrix is obtained by the following steps:

decomposing the point-spread function matrix and obtaining the singular values thereof using a Singular Value Decomposition method; and

obtaining the pseudo-inverse of the point-spread function matrix based on the decomposed point-spread function matrix.

8. The device manufacturing method of claim 7, wherein singular values of the point-spread function matrix with magnitude less than a threshold magnitude are excluded prior to inversion.

9. The device manufacturing method of claim 8, wherein the threshold magnitude is equal to about 10% of the amplitude of a maximum singular value.

10. The device manufacturing method of claim 6, wherein the column vector represents the requested pattern as defined at a plurality of grid positions on the substrate.