Exposure method, exposure apparatus, and method for producing device
First Claim
1. An exposure method for exposing one of a first object and a second object with an exposure light beam passing through the other of the first object and the second object by using an exposure apparatus provided with an airtight stage chamber in which a movable stage is provided, the exposure method comprising:
- importing the second object into the airtight stage chamber, wherein an inner wall of a member which forms the airtight stage chamber is formed of or coated with a material involving little gas release;
detecting, before the second object is installed on the movable stage, a position of the second object with respect to the movable stage by using a detecting system provided in the airtight stage chamber;
adjusting the position of the second object with respect to the movable stage in the airtight stage chamber based on a result of the detecting;
installing, on the movable stage, the second object which has been adjusted;
moving the movable stage to adjust the position of the second object with respect to an exposure position; and
exposing one of the first object and the second object with the exposure light beam passing through the other of the first object and the second object.
1 Assignment
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Accused Products
Abstract
An exposure apparatus for exposing a substrate with an exposure light beam passing through a mask comprises a movable stage for moving the substrate, a stage chamber for accommodating the movable stage, a transport system for transporting the substrate into the stage chamber, and a first alignment system for performing positional adjustment for the substrate with respect to the movable stage in the stage chamber. The position of an exposure objective delivered from the transport system into the stage chamber can be subjected to positional adjustment by using the first alignment system. The stage chamber and the movable stage can be assembled to a frame of the exposure apparatus in accordance with the module system. The exposure apparatus includes a second alignment system for performing positional adjustment for the substrate installed on the movable stage at an exposure position.
55 Citations
22 Claims
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1. An exposure method for exposing one of a first object and a second object with an exposure light beam passing through the other of the first object and the second object by using an exposure apparatus provided with an airtight stage chamber in which a movable stage is provided, the exposure method comprising:
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importing the second object into the airtight stage chamber, wherein an inner wall of a member which forms the airtight stage chamber is formed of or coated with a material involving little gas release; detecting, before the second object is installed on the movable stage, a position of the second object with respect to the movable stage by using a detecting system provided in the airtight stage chamber; adjusting the position of the second object with respect to the movable stage in the airtight stage chamber based on a result of the detecting; installing, on the movable stage, the second object which has been adjusted; moving the movable stage to adjust the position of the second object with respect to an exposure position; and exposing one of the first object and the second object with the exposure light beam passing through the other of the first object and the second object. - View Dependent Claims (2, 3, 4, 5, 6)
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7. An exposure method for exposing one of a first object and a second object with an exposure light beam passing through the other of the first object and the second object, the exposure method comprising:
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transporting the second object to a movable stage by the aid of a transport system; adjusting a position of the second object with respect to the transport system on a contour basis in an airtight chamber in which the transport system is located during the transport of the second object to the movable stage by the aid of the transport system, wherein an inner wall of a member which forms the airtight chamber is formed of or coated with a material involving little gas release; transporting the second object, of which position has been adjusted in the airtight chamber, to the movable stage through a space in which air-tightness is maintained; and exposing one of the first object and the second object transported to the movable stage with the exposure light beam passing through the other of the first object and the second object. - View Dependent Claims (8, 9, 10, 11, 12)
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13. An exposure apparatus for exposing one of a first object and a second object with an exposure light beam passing through the other of the first object and the second object, the exposure apparatus comprising:
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a movable stage which adjusts a position of the second object; and a transport system which is arranged in an airtight transport chamber, an inner wall of which is formed of or coated with a material involving little gas release, and which transports the second object to the movable stage through a space in which air-tightness is maintained, wherein the transport system includes; a handling mechanism which has two or more degrees of freedom of displacement for incorporating the second object from the outside; a contour-detecting system which detects position information on a contour of the second object held by the handling mechanism; and an arm mechanism which has at least one degree of freedom of displacement for transporting the second object delivered from the handling mechanism in a direction toward the movable stage. - View Dependent Claims (14, 15, 16, 17, 18, 19)
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20. An exposure method for exposing a substrate with an exposure light beam by using an exposure apparatus provided with an airtight stage chamber in which a movable stage is provided, the exposure method comprising:
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importing the substrate into the airtight stage chamber, wherein an inner wall of a member which forms the airtight stage chamber is formed of or coated with a material involving little gas release; detecting, before the substrate is installed on the movable stage, a position of the substrate with respect to the movable stage by using a detecting system provided in the airtight stage chamber; adjusting the position of the substrate with respect to the movable stage in the airtight stage chamber based on a result of the detecting; installing, on the movable stage, the substrate which has been adjusted; moving the movable stage to adjust the position of the substrate with respect to an exposure position; and exposing the substrate with the exposure light beam.
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21. An exposure method for exposing a substrate with an exposure light beam, the exposure method comprising:
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transporting the substrate to a movable stage by the aid of a transport system; adjusting a position of the substrate with respect to the transport system on a contour basis in an airtight chamber in which the transport system is located during the transport of the substrate to the movable stage by the aid of the transport system, wherein an inner wall of a member which forms the airtight chamber is formed of or coated with a material involving little gas release; transporting the substrate, of which position has been adjusted in the airtight chamber, to the movable stage through a space in which air-tightness is maintained; and exposing the substrate transported to the movable stage with the exposure light beam.
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22. An exposure apparatus for exposing a substrate with an exposure light beam, the exposure apparatus comprising:
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a movable stage which adjusts a position of the substrate; and a transport system which is arranged in an airtight transport chamber, an inner wall of which is formed of or coated with a material involving little gas release, and which transports the substrate to the movable stage through a space in which air-tightness is maintained, wherein the transport system includes; a handling mechanism which has two or more degrees of freedom of displacement for incorporating the substrate from the outside; a contour-detecting system which detects position information on a contour of the substrate held by the handling mechanism; and an arm mechanism which has at least one degree of freedom of displacement for transporting the substrate delivered from the handling mechanism in a direction toward the movable stage.
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Specification