Method of fabricating array substrate having color filter on thin film transistor structure
First Claim
1. A method of forming an array substrate for use in a liquid crystal display device, comprising:
- forming a gate line on a substrate along a first direction, a gate pad at one end of the gate line, and a gate electrode extending from the gate line;
forming a first gate insulating layer on the substrate to cover the gate line, the gate pad, and the gate electrode;
forming an active layer of intrinsic amorphous silicon and an ohmic contact layer of extrinsic amorphous silicon layer sequentially on the first gate insulating layer over the gate electrode;
forming a data line, a data pad, a source electrode, and a drain electrode, the data line disposed extending along a second direction to perpendicularly cross the gate line to define a pixel region, the data pad disposed at one end of the data line, the source electrode extending from the data line on a first portion of the ohmic contact layer, and the drain electrode spaced apart from the source electrode on a second portion of the ohmic contact layer to form a thin film transistor;
forming a second insulating layer over an entire surface of the substrate to cover the thin film transistor;
forming a black matrix on the second insulating layer to cover the thin film transistor, the gate line, and the data line except a first portion of the drain electrode;
forming a third insulating layer over an entire surface of the substrate to cover the black matrix;
patterning the first, second, and third insulating layers to expose the first portion of drain electrode, to form a gate pad contact hole exposing the gate pad, and to form a data pad contact hole exposing the data pad;
forming a first transparent electrode layer over an entire surface of the substrate to cover the patterned third insulating layer and contacting the exposed first portion of the drain electrode;
coating an adhesive color film on the first transparent electrode layer, the adhesive color film having a color resin on a surface facing the first transparent electrode layer;
irradiating a laser to portions of the adhesive color film corresponding to the pixel region;
removing the adhesive color film after irradiating the laser to form a color film within the pixel region wherein the laser is irradiated;
repeating coating the adhesive color film, irradiating the laser and removing the adhesive color film to form the color film within all of the pixel regions;
forming a second transparent electrode layer over an entire surface of the substrate to cover the color filter and the first transparent electrode layer; and
patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal.
2 Assignments
0 Petitions
Accused Products
Abstract
A method of forming an array substrate for use in a liquid crystal display device includes forming a gate line, a gate pad, and a gate electrode, forming a first gate insulating layer to cover the gate line, the gate pad, and the gate electrode, forming an active layer and an ohmic contact layer on the first gate insulating layer, forming a data line, a data pad, a source electrode, and a drain electrode, forming a second insulating layer to cover the thin film transistor, forming a black matrix on the second insulating layer to cover the thin film transistor, the gate line, and the data line except a first portion of the drain electrode, forming a third insulating layer to cover the black matrix, patterning the first, second, and third insulating layers, forming a first transparent electrode layer to cover the patterned third insulating layer, coating an adhesive color film on the first transparent electrode layer, irradiating a laser to portions of the adhesive color film corresponding to the pixel region, removing the adhesive color film to form a color film, repeating coating the adhesive color film, irradiating the laser and removing the adhesive color film to form the color film within all of the pixel regions, forming a second transparent electrode to cover the color filter and the first transparent electrode layer, and patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal.
11 Citations
17 Claims
-
1. A method of forming an array substrate for use in a liquid crystal display device, comprising:
-
forming a gate line on a substrate along a first direction, a gate pad at one end of the gate line, and a gate electrode extending from the gate line; forming a first gate insulating layer on the substrate to cover the gate line, the gate pad, and the gate electrode; forming an active layer of intrinsic amorphous silicon and an ohmic contact layer of extrinsic amorphous silicon layer sequentially on the first gate insulating layer over the gate electrode; forming a data line, a data pad, a source electrode, and a drain electrode, the data line disposed extending along a second direction to perpendicularly cross the gate line to define a pixel region, the data pad disposed at one end of the data line, the source electrode extending from the data line on a first portion of the ohmic contact layer, and the drain electrode spaced apart from the source electrode on a second portion of the ohmic contact layer to form a thin film transistor; forming a second insulating layer over an entire surface of the substrate to cover the thin film transistor; forming a black matrix on the second insulating layer to cover the thin film transistor, the gate line, and the data line except a first portion of the drain electrode; forming a third insulating layer over an entire surface of the substrate to cover the black matrix; patterning the first, second, and third insulating layers to expose the first portion of drain electrode, to form a gate pad contact hole exposing the gate pad, and to form a data pad contact hole exposing the data pad; forming a first transparent electrode layer over an entire surface of the substrate to cover the patterned third insulating layer and contacting the exposed first portion of the drain electrode; coating an adhesive color film on the first transparent electrode layer, the adhesive color film having a color resin on a surface facing the first transparent electrode layer; irradiating a laser to portions of the adhesive color film corresponding to the pixel region; removing the adhesive color film after irradiating the laser to form a color film within the pixel region wherein the laser is irradiated; repeating coating the adhesive color film, irradiating the laser and removing the adhesive color film to form the color film within all of the pixel regions; forming a second transparent electrode layer over an entire surface of the substrate to cover the color filter and the first transparent electrode layer; and patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
-
Specification
-
- Resources
-
Current AssigneeLG Display Co., Ltd.
-
Original AssigneeLG Philips LCD Company Limited (LG Display Co., Ltd.)
-
InventorsChang, Youn-Gyoung, Park, Seung-Ryull
-
Primary Examiner(s)NGO, HUYEN LE
-
Application NumberUS10/728,835Publication NumberTime in Patent Office1,058 DaysField of Search349/106, 349/43, 349/187, 345/88, 345/92, 257/59US Class Current349/43CPC Class CodesG02F 1/133516 Methods for their manufactu...G02F 1/136222 Colour filters incorporated...
