Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators
First Claim
1. An electron-beam deposition system, comprising:
- an evaporation source comprisinga source target having a target location at which a deposition material may be positioned, anda controllable electron-beam source disposed to direct an electron beam at the target location;
a trailing-indicator monitor that measures a past evaporation performance of the evaporation source and has a trailing-indicator output;
a leading-indicator monitor that measures a future evaporation performance of the evaporation source and has a leading-indicator output; and
a controller which receives the trailing-indicator output and the leading-indicator output, and controls the electron-beam source responsive to the trailing-indicator output and to the leading-indicator output.
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Accused Products
Abstract
An electron-beam deposition system includes an evaporation source having a source target with a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location. A trailing-indicator monitor measures a past evaporation performance of the evaporation source and has a trailing-indicator output, and a leading-indicator monitor measures a future evaporation performance of the evaporation source and has a leading-indicator output. A controller receives the trailing-indicator output and the leading-indicator output, and controls the electron-beam source responsive to the trailing-indicator output and to the leading-indicator output. Preferably, the trailing-indicator monitor measures a deposition of the deposition material on a monitored substrate, and the leading-indicator monitor measures a brightness of the deposition material in the evaporation source.
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Citations
19 Claims
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1. An electron-beam deposition system, comprising:
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an evaporation source comprising a source target having a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location; a trailing-indicator monitor that measures a past evaporation performance of the evaporation source and has a trailing-indicator output; a leading-indicator monitor that measures a future evaporation performance of the evaporation source and has a leading-indicator output; and a controller which receives the trailing-indicator output and the leading-indicator output, and controls the electron-beam source responsive to the trailing-indicator output and to the leading-indicator output. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An electron-beam deposition system, comprising:
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an evaporation source comprising a source target having a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location; a deposition monitor that measures a deposition of the deposition material on a monitored substrate and has a deposition-rate output; a brightness monitor that measures a brightness of the deposition material in the evaporation source and has a brightness output; and a controller which receives the deposition-rate output and the brightness output, and controls the electron-beam source responsive to the deposition-rate output and to the brightness output, wherein the controller controls an electron-beam spot size of the electron-beam source. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
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Specification