Method of dynamically designing a preventative maintenance schedule based upon sensor data, and system for accomplishing same

• US 7,130,769 B1
• Filed: 01/30/2002
• Issued: 10/31/2006
• Est. Priority Date: 01/30/2002
• Status: Active Grant

• Current Assignee: Advanced Micro Devices, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Allen, Jr., Sam H., Conboy, Michael R., Coss, Jr., Elfido
• Primary Examiner(s): Hoff, Marc S.
• Assistant Examiner(s): Huynh, Phuong
• Application Number:
  US10/060,877
• Time in Patent Office: 1,735 Days
• Field of Search: 702/184, 702/113, 702/114, 702/119, 702/122, 702/123, 702/155, 700/99, 700/100, 700108-110
• US Class Current: 702/184
• CPC Class Codes: G05B 23/0235 based on a comparison with predetermined threshold or range, e.g. "classical methods", carried out during normal operation; threshold adaptation or choice; when or how to compare with the threshold
• CPC Class Codes: G05B 23/0283 Predictive maintenance, e.g. involving the monitoring of a system and, based on the monitoring results, taking decisions on the maintenance schedule of the monitored system; Estimating remaining useful life [RUL] preventive maintenance, i.e. planning maintenance according to the available resources without monitoring the system G06Q10/06

Abstract

In one example, the method includes operating a process tool that has a plurality of sensors for sensing at least one parameter associated with the operation of the process tool, obtaining data from the sensors and determining at least one maintenance activity for the process tool based upon the data obtained from the sensors. In another example, data from the sensors is provided to a controller that analyzes the data and indicates desired variations in at least one maintenance activity to be performed on the process tool based upon the analysis of the data. In yet another example, the controller identifies a plurality of maintenance activities to be performed on the process tool based upon the analysis of the data.

Claims

1. A method, comprising:

operating a process tool, said process tool having a plurality of sensors operatively coupled to said tool for sensing at least one parameter associated with the operation of said process tool;

obtaining data from said sensors; and

deciding preventative maintenance procedures that are not to be performed on said process tool if said data obtained from said sensors indicates that a number of abnormal process events that occurred with respect to said aspect of said process tool exceeds an allowable limit.

2. The method of claim 1, wherein operating a process tool comprises operating at least one of a deposition tool, an etch tool, an ion implant tool, a chemical mechanical polishing tool, a furnace and a rapid thermal anneal chamber.

3. The method of claim 1, wherein said plurality of sensors are adapted to sense at least one of a temperature, a pressure, a gas flow rate, a movement of a wafer positioned in said tool, a positioning of a wafer within said tool and a cleanliness of a process chamber within said tool.

4. The method of claim 1, wherein obtaining data from said sensors comprises obtaining data from said sensors and providing it to a controller.

5. The method of claim 1, wherein each of said plurality of sensors is at least one of a temperature sensor, a pressure sensor, a gas flow rate sensor, an electrical current sensor, an electrical voltage sensor, a vacuum sensor, and an optical sensor.

6. A method, comprising:

operating a process tool, said process tool having a plurality of sensors operatively coupled to said tool for sensing at least one parameter associated with the operation of said process tool;

obtaining data from said sensors; and

designing a preventative maintenance program for said process tool based upon said data obtained from said sensors, wherein designing said preventative maintenance program comprises deciding preventative maintenance activities that are not to be performed on said tool based upon said data obtained from said sensors.

7. The method of claim 6, wherein operating a process tool comprises operating at least one of a deposition tool, an etch tool, an ion implant tool, a chemical mechanical polishing tool, a furnace and a rapid thermal anneal chamber.

8. The method of claim 6, wherein said plurality of sensors are adapted to sense at least one of a temperature, a pressure, a gas flow rate, a movement of a wafer positioned in said tool, a positioning of a wafer within said tool and a cleanliness of a process chamber within said tool.

9. The method of claim 6, wherein obtaining data from said sensors comprises obtaining data from said sensors and providing it to a controller.

10. The method of claim 6, wherein each of said plurality of sensors is at least one of a temperature sensor, a pressure sensor, a gas flow rate sensor, an electrical current sensor, an electrical voltage sensor, a vacuum sensor, and an optical sensor.

11. The method of claim 6, wherein designing said preventative maintenance program for said process tool based upon said data obtained from said sensors further comprises increasing preventative maintenance activities on an aspect of said process tool if said data obtained from said sensors indicates that the number of abnormal process events that occurred with respect to said aspect of said process tool exceeded an allowable limit.

12. The method of claim 6, wherein designing said preventative maintenance program for said process tool based upon said data obtained from said sensors further comprises decreasing preventative maintenance activities on an aspect of said process tool if said data obtained from said sensors indicates that the number of abnormal process events that occurred with respect to said aspect of said process tool is less than a preselected limit.

13. The method of claim 6, further comprising performing said designed preventative maintenance program on said process tool.

14. A method, comprising:

operating a process tool, said process tool having a plurality of sensors operatively coupled to said tool for sensing at least one parameter associated with the operation of said process tool;

obtaining data from said sensors; and

providing said data to a controller that analyzes said data obtained from said sensors and indicates at least one preventative maintenance activity that is not to be performed on said process tool based upon said analysis of said data.

15. The method of claim 14, wherein operating a process tool comprises operating at least one of a deposition tool, an etch tool, an ion implant tool, a chemical mechanical polishing tool, a furnace and a rapid thermal anneal chamber.

16. The method of claim 14, wherein said plurality of sensors are adapted to sense at least one of a temperature, a pressure, a gas flow rate, a movement of a wafer positioned in said tool, a positioning of a wafer within said tool and a cleanliness of a process chamber within said tool.

17. The method of claim 14, wherein each of said plurality of sensors is at least one of a temperature sensor, a pressure sensor, a gas flow rate sensor, an electrical current sensor, an electrical voltage sensor, a vacuum sensor, and an optical sensor.

18. The method of claim 14, further comprising performing said at least one maintenance activity on said process tool.

19. A method, comprising:

operating a process tool, said process tool having a plurality of sensors operatively coupled to said tool for sensing at least one parameter associated with the operation of said process tool;

obtaining data from said sensors; and

providing said data to a controller that analyzes said data obtained from said sensors and identifies a plurality of maintenance activities that are not to be performed on said process tool based upon said analysis of said data.

20. The method of claim 19, wherein operating a process tool comprises operating at least one of a deposition tool, an etch tool, an ion implant tool, a chemical mechanical polishing tool, a furnace and a rapid thermal anneal chamber.

21. The method of claim 19, wherein said plurality of sensors are adapted to sense at least one of a temperature, a pressure, a gas flow rate, a movement of a wafer positioned in said tool, a positioning of a wafer within said tool and a cleanliness of a process chamber within said tool.

22. The method of claim 19, wherein each of said plurality of sensors is at least one of a temperature sensor, a pressure sensor, a gas flow rate sensor, an electrical current sensor, an electrical voltage sensor, a vacuum sensor, and an optical sensor.

23. The method of claim 19, further comprising performing said identified plurality of maintenance activities on said process tool.

24. A system, comprising:

a process tool adapted to perform a process operation;

a plurality of sensors operatively coupled to said process tool to sense at least one parameter associated with the process operation of said process tool; and

a controller for analyzing data sensed by said plurality of sensors and determining at least one maintenance activity that is not to be performed on said process tool based upon said data sensed by said sensors, wherein said controller is adapted to increase at least one maintenance activity on an aspect of said process tool if said data obtained from said sensors indicates that a number of abnormal process events that occurred with respect to said aspect of said process tool exceeds an allowable limit.

25. The system of claim 24, wherein said process tool is at least one of a deposition tool, an etch tool, an ion implant tool, a chemical mechanical polishing tool, a furnace and a rapid thermal anneal chamber.

26. The system of claim 24, wherein each of said sensors is at least one of a temperature sensor, a pressure sensor, a gas flow rate sensor, an electrical current sensor, an electrical voltage sensor, a vacuum sensor, and an optical sensor.

27. The system of claim 24, wherein said controller is a stand-alone controller.

28. The system of claim 24, wherein said controller is resident on said process tool.