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Integrated process condition sensing wafer and data analysis system

  • US 7,135,852 B2
  • Filed: 04/29/2004
  • Issued: 11/14/2006
  • Est. Priority Date: 12/03/2002
  • Status: Active Grant
First Claim
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1. An instrument for measuring a parameter, comprising:

  • a substrate,a plurality of sensors carried by and distributed at positions across a surface of the substrate that individually measure the parameter at those positions,at least one electronic processing component carried by the substrate surface,electrical conductors extending across the substrate surface and connected to the plurality of sensors and said at least one electronic processing component,wherein the sensors and said at least one electronic component are positioned in cavities formed into the substrate surface, anda material filling the cavities around the sensors and said at least one electronic component.

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