Interferometry systems involving a dynamic beam-steering assembly

• US 7,139,080 B2
• Filed: 06/17/2003
• Issued: 11/21/2006
• Est. Priority Date: 09/18/1998
• Status: Expired due to Fees

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Hill, Henry A., Kreuzer, Justin
• Primary Examiner(s): Toatley, Jr., Gregory J.
• Assistant Examiner(s): CONNOLLY, PATRICK J
• Application Number:
  US10/464,829
• Publication Number:
  US 20040114152A1
• Time in Patent Office: 1,253 Days
• Field of Search: 356485-487, 356/492, 356/493, 356/498, 356/500, 356/509, 430/5, 355/53
• US Class Current: 356/498
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02003 using beat frequencies
• CPC Class Codes: G01B 9/02007 Two or more frequencies or sources used for interferometric measurement using only beat G01B9/02003
• CPC Class Codes: G01B 9/02019 contacting different points on same face of object
• CPC Class Codes: G01B 9/02021 contacting different faces of object, e.g. opposite faces
• CPC Class Codes: G01B 9/02061 Reduction or prevention of effects of tilts or misalignment
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position

Abstract

An apparatus including: a multi-axis interferometry system configured to receive an input beam and direct at least two beams derived from the input beam to contact different locations on a measurement object to monitor changes in an angular orientation of the measurement object; a beam steering assembly having a beam steering element positioned to direct the input beam into the interferometry system and a positioning system to selectively orient the beam steering element relative to the interferometry system; and a control circuit which during operation orients the beam steering element based on the changes in the angular orientation of the measurement object monitored by the interferometry system.

Claims

1. Apparatus comprising:

a multi-axis interferometry system configured to receive an input beam and direct at least two beams derived from the input beam to contact different locations on a measurement object to monitor changes in an angular orientation of the measurement object;

a beam steering assembly having a beam steering element positioned to direct the input beam into the interferometry system and a positioning system to selectively orient the beam steering element relative to the interferometry system; and

a control circuit which during operation orients the beam steering element based on the changes in the angular orientation of the measurement object monitored by the interferometry system.

2. The apparatus of claim 1, wherein the control circuit causes the beams to contact the measurement object at substantially normal incidence over a range of angular orientations of the measurement object.

3. The apparatus of claim 1, wherein the two beams that contact the measurement object are measurement beams, and wherein the multi-axis interferometry system is configured to combine each of the two measurement beams with a corresponding reference beam after they contact the measurement object to produce a pair of output beams comprising interferometric information about changes in distance to the different locations on the measurement object.

4. The apparatus of claim 3, wherein during operation the control circuit calculates a control signal using the interferometric information in the output beams arid causes the positioning system to orient the beam steering element based on the control signal.

5. The apparatus of claim 4, wherein the control circuit comprises multiple detectors for measuring an intensity of each output beam, a signal processor for calculating the changes in distance to the different locations of the measurement object from the measured intensities and generating the control signal based on the calculated distance changes, and a control system for causing the positioning system to orient the beam steering element in response to the control signal.

6. The apparatus of claim 5, further comprising a polarizer prior to each detector to cause the measured intensity of each output beam to correspond to the intensity of a selected polarization component of that output beam.

7. The apparatus of claim 3, wherein the multi-axis interferometry system directs each measurement beam to make an even number of passes to the measurement object before combining it with its corresponding reference beam.

8. The apparatus of claim 3, wherein the multi-axis interferometry system directs each measurement beam to make only one pass to the measurement object before combining it with its corresponding reference beam.

9. The apparatus of claim 3, wherein the multi-axis interferometry system comprises separate single-axis interferometers each producing a corresponding measurement beam and optics for directing a portion of the input beam to each of the interferometers.

10. The apparatus of claim 3, wherein the multi-axis interferometry system comprises an integral multi-axis interferometer comprising multiple measurement axes each corresponding to one of the measurement beams.

11. The apparatus of claim 1, wherein the multi-axis interferometry system is configured to combine the two beams with one another after they contact the measurement object to produce an output beam comprising interferometric information about the changes in the angular orientation of the measurement object.

12. The apparatus of claim 11, wherein during operation the control circuit calculates a control signal using the interferometric information in the output beam and causes the positioning system to orient the beam steering element based on the control signal.

13. The apparatus of claim 12, wherein the control circuit comprises a detector for measuring an intensity of the output beam, a signal processor for calculating the changes in the angular orientation of the measurement object from the measured intensity and generating the control signal from the calculated changes in angular orientation, and a control system for causing the positioning system to orient the beam steering element in response to the control signal.

14. The apparatus of claim 13, further comprising a polarizer prior to the detector to cause the measured intensity of the output beam to correspond to the intensity of a selected polarization component of the output beam.

15. The apparatus of claim 1, wherein the multi-axis interferometry system directs at least three measurement beams to contact the measurement object at different locations.

16. The apparatus of claim 1, wherein the changes in the angular orientation of the measurement object monitored by the interferometry system are relative to a reference object.

17. The apparatus of claim 16, wherein the reference object is fixed in the interferometry system.

18. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer;

an illumination system for imaging spatially patterned radiation onto the wafer;

a positioning system for adjusting the position of the stage relative to the imaged radiation; and

the apparatus of claim 1 for monitoring the position of the wafer relative to the imaged radiation.

19. The system of claim 18, wherein the measurement object comprises the stage.

20. The system of claim 18, wherein the multi-axis interferometry system is supported by the stage.

21. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer; and

an illumination system including a radiation source, a mask, a positioning system, a lens assembly, and the apparatus of claim 1, wherein during operation the source directs radiation through the mask to produce spatially patterned radiation, the positioning system adjusts the position of the mask relative to the radiation from the source, the lens assembly images the spatially patterned radiation onto the wafer, and the apparatus monitors the position of the mask relative to the radiation from the source.

22. The system of claim 21, wherein the measurement object comprises the mask.

23. The system of claim 21, wherein the multi-axis interferometry system is attached to the mask.

24. A beam writing system for use in fabricating a lithography mask, the system comprising:

a source providing a write beam to pattern a substrate;

a stage supporting the substrate;

a beam directing assembly for delivering the write beam to the substrate;

a positioning system for positioning the stage and beam directing assembly relative one another; and

the apparatus of claim 1, for monitoring the position of the stage relative to the beam directing assembly.

25. A method for fabricating integrated circuits comprising:

applying a resist to a wafer;

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography system of claim 21; and

producing an integrated circuit from the wafer.

26. Apparatus comprising:

a multi-axis interferometry system configured to direct at least two beams to contact different locations on a measurement object to monitor changes in an angular orientation of the measurement object, the interferometry system comprising a beam steering assembly having a beam steering element positioned to direct and contact at least one of the beams and a positioning system to selectively orient the beam steering element within the interferometry system; and

a control circuit which during operation orients the beam steering element based on the changes in the angular orientation of the measurement object monitored by the interferometry system.

27. The apparatus of claim 26, wherein the beam steering element is positioned to direct multiple ones of the beams that contact the measurement object.

28. The apparatus of claim 26, wherein the multi-axis interferometry system comprises at least one additional beam steering assembly having a beam steering element positioned to direct and contact another one of the beams that contact the measurement object and a positioning system to selectively orient the beam steering element in the additional beam steering assembly.

29. The apparatus of claim 28, wherein during operation the control circuit causes the positioning system in the additional beam steering assembly to orient the beam steering element in the additional beam steering assembly in response to the control signal.

30. The apparatus of claim 26, wherein the control circuit causes the beams to contact the measurement object at substantially normal incidence over a range of angular orientations of the measurement object.

31. The apparatus of claim 26, wherein the two beams that contact the measurement object are measurement beams, and wherein the multi-axis interferometry system is configured to combine each of the two measurement beams with a corresponding reference beam after they contact the measurement object to produce a pair of output beams comprising interferometric information about changes in distance to the different locations on the measurement object.

32. The apparatus of claim 31, wherein during operation the control circuit calculates a control signal using the interferometric information in the output beams and causes the positioning system to orient the beam steering element based on the control signal.

33. The apparatus of claim 32, wherein the control circuit comprises multiple detectors for measuring an intensity of each output beam, a signal processor for calculating the changes in distance to the different locations of the measurement object from the measured intensities and generating the control signal based on the calculated distance changes, and a control system for causing the positioning system to orient the beam steering element in response to the control signal.

34. The apparatus of claim 33, further comprising a polarizer prior to each detector to cause the measured intensity of each output beam to correspond to the intensity of a selected polarization component of that output beam.

35. The apparatus of claim 31, wherein the multi-axis interferometry system directs each measurement beam to make an even number of passes to the measurement object before combining it with its corresponding reference beam.

36. The apparatus of claim 31, wherein the multi-axis interferometry system directs each measurement beam to make only one pass to the measurement object before combining it with its corresponding reference beam.

37. The apparatus of claim 31, wherein the multi-axis interferometry system comprises separate single-axis interferometers each producing a corresponding measurement beam and optics for directing a portion of the input beam to each of the interferometers.

38. The apparatus of claim 26, wherein the multi-axis interferometry system comprises an integral multi-axis interferometer comprising multiple measurement axes each corresponding to one of the measurement beams.

39. The apparatus of claim 26, wherein the multi-axis interferometry system is configured to combine the two beams with one another after they contact the measurement object to produce an output beam comprising interferometric information about the changes in the angular orientation of the measurement object.

40. The apparatus of claim 39, wherein during operation the control circuit calculates a control signal using the interferometric information in the output beam and causes the positioning system to orient the beam steering element based on the control signal.

41. The apparatus of claim 40, wherein the control circuit comprises a detector for measuring an intensity of the output beam, a signal processor for calculating the changes in the angular orientation of the measurement object from the measured intensity and generating the control signal from the calculated changes in angular orientation, and a control system for causing the positioning system to orient the beam steering element in response to the control signal.

42. The apparatus of claim 26, wherein the multi-axis interferometry system directs at least three measurement beams to contact the measurement object at different locations.

43. The apparatus of claim 26, wherein the changes in the angular orientation of the measurement object monitored by the interferometry system are relative to a reference object.

44. The apparatus of claim 43, wherein the reference object is fixed in the interferometry system.

45. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer;

an illumination system for imaging spatially patterned radiation onto the wafer;

a positioning system for adjusting the position of the stage relative to the imaged radiation; and

the apparatus of claim 26 for monitoring the position of the wafer relative to the imaged radiation.

46. The system of claim 45, wherein the measurement object comprises the stage.

47. The system of claim 45, wherein the multi-axis interferometry system is attached to the stage.

48. A lithography system for use in fabricating integrated circuits on a wafer, the system comprising:

a stage for supporting the wafer; and

an illumination system including a radiation source, a mask, a positioning system, a lens assembly, and the apparatus of claim 26, wherein during operation the source directs radiation through the mask to produce spatially patterned radiation, the positioning system adjusts the position of the mask relative to the radiation from the source, the lens assembly images the spatially patterned radiation onto the wafer, and the apparatus monitors the position of the mask relative to the radiation from the source.

49. The system of claim 48, wherein the measurement object comprises the mask.

50. The system of claim 48, wherein the multi-axis interferometry system is attached to the mask.

51. A beam writing system for use in fabricating a lithography mask, the system comprising:

a source providing a write beam to pattern a substrate;

a stage supporting the substrate;

a beam directing assembly for delivering the write beam to the substrate;

a positioning system for positioning the stage and beam directing assembly relative one another; and

the apparatus of claim 26, for monitoring the position of the stage relative to the beam directing assembly.

52. A method for fabricating integrated circuits comprising:

applying a resist to a wafer;

forming a pattern of a mask in the resist by exposing the wafer to radiation using the lithography system of claim 48; and

producing an integrated circuit from the wafer.

53. A method for fabricating a lithography mask comprising:

directing a beam to a substrate using the beam writing system of claim 51;

varying the intensity or the position of the beam at the substrate to form a pattern in the substrate; and

forming the lithography mask from the patterned substrate.