X-ray reflectivity system with variable spot
First Claim
1. An x-ray reflectometry system for performing reflectometry on a test sample, the x-ray reflectometry system comprising:
- an x-ray tube for generating an x-ray beam;
beam focusing optics for focusing the x-ray beam onto a measurement location on the test sample; and
a sensor for measuring x-rays reflected from the test sample,wherein the x-ray tube comprises;
a target;
an electron source for generating an electron beam; and
a scanning mechanism for scanning the electron beam across a source region of the target to cause the source region to emit the x-ray beam, wherein the source region is larger than a cross-section of the electron beam.
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Accused Products
Abstract
Thin film thickness measurement accuracy in x-ray reflectometry systems can be enhanced by minimizing scattering and beam spreading effects. A reflectometry system can include an x-ray tube that can produce an x-ray beam having any cross-sectional shape by scanning an electron beam in an appropriate pattern over a target in an x-ray tube. For example, the electron beam can be scanned over the target in a pattern having a non-unitary aspect ratio, so that the x-ray beam is generated from a source region having a non-unitary aspect ratio. The elongation allows the beam direction dimension to be substantially reduced, without causing overheating of the target. By blocking portions of the x-ray beam focused on the thin film and generating reflectivity curves in increments, the effects of scattering can be minimized.
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Citations
21 Claims
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1. An x-ray reflectometry system for performing reflectometry on a test sample, the x-ray reflectometry system comprising:
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an x-ray tube for generating an x-ray beam; beam focusing optics for focusing the x-ray beam onto a measurement location on the test sample; and a sensor for measuring x-rays reflected from the test sample, wherein the x-ray tube comprises; a target; an electron source for generating an electron beam; and a scanning mechanism for scanning the electron beam across a source region of the target to cause the source region to emit the x-ray beam, wherein the source region is larger than a cross-section of the electron beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method for taking an x-ray reflectometry measurement, the method comprising:
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generating a first x-ray beam by scanning a first electron beam across a first source region of a target to cause the first source region to emit the first x-ray beam; focusing the first x-ray beam onto a measurement location on a test sample; and measuring a first set of x-rays reflected from the measurement location. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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Specification