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Method of depositing germanium-containing films

  • US 7,141,488 B2
  • Filed: 04/02/2004
  • Issued: 11/28/2006
  • Est. Priority Date: 04/05/2003
  • Status: Expired due to Fees
First Claim
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1. A method of depositing a film containing germanium on a substrate comprising the steps of:

  • a) conveying two or more germanium compounds in a gaseous phase to a deposition chamber containing the substrate, wherein a first germanium compound is a halogermanium compound of the formula X14−

    a
    GeRa, wherein a=0–

    3, each X1 is independently a halogen, and each R is independently chosen from H, alkyl, alkenyl, alkynyl, aryl, and NR4R6, wherein each R4 and R6 are independently chosen from H, alkyl, alkenyl, alkynyl and aryl, and wherein a second germanium compound has the formula

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