Lithographic apparatus and device manufacturing method

• US 7,142,286 B2
• Filed: 07/27/2004
• Issued: 11/28/2006
• Est. Priority Date: 07/27/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: De Jager, Pieter Willem Herman
• Primary Examiner(s): MATHEWS, ALAN A
• Application Number:
  US10/899,302
• Publication Number:
  US 20060023190A1
• Time in Patent Office: 854 Days
• Field of Search: 355/53, 355/71, 355/77, 355/67, 359/224, 359/291, 359/619
• US Class Current: 355/71
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: Y10S 359/904 Micromirror

Abstract

A lithographic apparatus and method include an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, and a projection system that directs the patterned beam a substrate supported on a substrate table. The projection system defines a pupil. Either the pupil or the array of individually controllable elements is imaged onto a target portion of the substrate. The projection system includes an array of lenses with each lens in the array arranged to direct a respective part of the patterned beam onto a respective part of the target portion of the substrate. In one example, each of the individually controllable elements is selectively controllable to direct a respective part of the beam away from the pupil such that the proportion of the bean passing through the pupil is adjusted. In one example, the individually controllable elements are arranged in groups, such that radiation deflected by each element in one group is directed towards the same lens in the lens array. In one example, the individually controllable elements in any one group are controlled together to direct radiation in different directions away from the pupil, such that the pattern imparted to the beam by that group of elements is substantially symmetrical with respect to the pupil.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of individually controllable elements that pattern the beam; and

a projection system that projects the patterned beam onto a target portion of a substrate, the projection system defining a pupil and comprising an array of lenses,

wherein the array of lenses is arranged to direct a respective part of the patterned beam towards a respective part of the target portion of the substrate,

wherein the individually controllable elements are selectively controllable to progressively direct a respective part of the patterned beam away from the pupil, such that a amount of the patterned beam passing through the pupil is progressively varied,

wherein the individually controllable elements are arranged in groups, such that the patterned beam is directed by each element in each group towards a same lens in the lens array, and

wherein the individually controllable elements in each group are controlled together to direct the patterned beam in different directions away from the pupil, such that a pattern imparted onto the beam by that group of individually controllable elements is substantially symmetrical with respect to the pupil.

2. The apparatus of claim 1, wherein each of the groups of the individually controllable elements comprises two elements that progressively direct the patterned beam away from the pupil in directions inclined by 180°

with respect to each other.

3. The apparatus of claim 1, wherein the groups of the individually controllable elements comprises three elements that progressively direct the patterned beam away from the pupil in directions inclined at 120°

intervals with respect to each other.

4. The apparatus of claim 1, wherein the groups of the individually controllable elements comprises four elements that progressively direct radiation away from the pupil in directions inclined at 90°

intervals with respect to each other.

5. The apparatus of claim 1, wherein the individually controllable elements are mirrors that are tilted progressively away from a position in which the beam reflected by that mirror is symmetrical with respect to the pupil.

6. The apparatus of claim 5, further comprising:

a beam splitter that reflects the beam from the illumination system toward the individual controllable elements and transmits the patterned beam from the individually controllable elements towards the array of lenses.

7. The apparatus of claim 1, wherein the pupil is defined by a projection lens contrast aperture plate.

8. A device manufacturing method, comprising:

patterning a beam using an array of individually controllable elements;

projecting the patterned beam onto a target portion of a substrate using an array of lenses in a projection system, wherein the lens in the array of lenses is arranged to direct a respective part of the patterned beam towards a respective part of the target portion;

selectively controlling the individually controllable elements to progressively direct a respective part of the patterned beam away from a pupil in the projection system, such that an amount of the patterned beam passing through the pupil is progressively varied; and

controlling the individually controllable elements in groups,

wherein the individually controllable elements in each group direct the patterned beam towards a same lens in the array of lenses,

wherein the individually controllable elements in each group progressively direct radiation away from the pupil in different directions, such that the pattern imparted to the beam by each of the groups is substantially symmetrical with respect to the pupil.

9. The method of claim 8, further comprising:

forming one of the groups with two of the individually controllable elements, which are progressively adjusted to direct the patterned beam away from the pupil in directions inclined by 180°

with respect to each other.

10. The method of claim 8, further comprising:

forming one of the groups with three of the individually controllable elements, which are progressively adjusted to direct the patterned beam away from the pupil in directions inclined by 120°

with respect to each other.

11. The method of claim 8, further comprising:

forming one of the groups with four of the individually controllable elements, which are progressively adjusted to direct the patterned beam away from the pupil in directions inclined by 90°

with respect to each other.

12. The method of claim 8, further comprising:

using mirrors as the individually controllable elements, wherein the mirrors are tilted away from a position in which the patterned beam deflected by each of the mirrors is symmetrical with respect to the pupil.

13. The method of claim 12, further comprising:

directing the beam towards the individual controllable elements using a beam splitter; and

directing the patterned beam from the individually controllable elements towards the array of lenses via the beam splitter.

14. The method of claim 8, wherein a projection lens contrast aperture is positioned to define the pupil.

15. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of individually controllable elements that pattern the beam; and

a projection system that projects the patterned beam onto a target portion of a substrate, the projection system defining a pupil and comprising an array of lenses, which are arranged to direct a respective part of the patterned beam towards a respective part of the target portion,

wherein the individually controllable elements are arranged in groups, such that the patterned beam is directed by each element in each respective group towards a same respective lens in the lens array, and

wherein each of the individually controllable elements is selectively controllable to direct a respective part of the patterned beam away from the pupil, such that an amount of the patterned beam passing through the pupil is varied.

16. A device manufacturing method, comprising:

patterning a beam using an array of individually controllable elements;

projecting the patterned beam onto a target portion of a substrate using an array of lenses in a projection system, wherein lenses in the array of lenses are arranged to direct a respective part of the patterned beam towards a respective part of the target portion; and

controlling the individually controllable elements in groups,

wherein the individually controllable elements in the groups direct the patterned beam towards a same lens in the array of lenses,

wherein the individually controllable elements in the groups direct radiation away from a pupil of the projection system in different directions, such that the pattern imparted to the beam by the groups is substantially symmetrical with respect to the pupil.

17. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

an array of individually controllable elements that pattern the beam; and

a projection system that projects the patterned beam onto a target portion of a substrate, the projection system defining a pupil and comprising an array of lenses,

wherein the individually controllable elements are arranged in groups, such that the patterned beam is directed by each element in each group towards a same lens in the lens array, and

wherein the individually controllable elements in each group are controlled together to direct the patterned beam in different directions away from the pupil, such that a pattern imparted onto the beam by that group of individually controllable elements is substantially symmetrical with respect to the pupil.