Lithographic apparatus, device manufacturing method, and device manufactured thereby

• US 7,142,287 B2
• Filed: 02/02/2006
• Issued: 11/28/2006
• Est. Priority Date: 12/31/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Kroon, Mark, Kurt, Ralph, Owen, Cassandra May, Van Beek, Michael Cornelis, Dirksen, Peter
• Primary Examiner(s): Kim, Peter B.
• Application Number:
  US11/345,316
• Publication Number:
  US 20060176463A1
• Time in Patent Office: 299 Days
• Field of Search: 355/71, 355/53, 355/55, 355/63, 355/67, 359/350, 369/13.38
• US Class Current: 355/71
• CPC Class Codes: G03F 7/70808 Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70933 Purge, e.g. exchanging fluid or gas to remove pollutants
• CPC Class Codes: G03F 7/70983 Optical system protection, e.g. pellicles or removable covers for protection of mask

Abstract

A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

Claims

1. A lithographic projection apparatus comprising:

a radiation system that provides a beam of radiation;

a support structure that supports a patterning structure, the patterning structure configured to pattern the beam of radiation according to a desired pattern;

a substrate support that supports a substrate;

a projection system that projects the patterned beam onto a target portion of the substrate, said projection system including an optical element that has a beam entry area and an optical element that has a beam exit area through each of which said patterned beam passes; and

a nucleated surface associated with said projection system on which a plurality of nucleation sites are provided, said surface being disposed away from at least one of said beam entry area and said beam exit area.

2. A lithographic projection apparatus according to claim 1, wherein said nucleated surface is made of the same material as at least one of said optical elements.

3. A lithographic projection apparatus according to claim 1, wherein said nucleated surface comprises quartz.

4. A lithographic projection apparatus according to claim 1, wherein said nucleated surface comprises a rough texture.

5. A lithographic projection apparatus according to claim 1, wherein said nucleated surface includes at least one tube disposed on a surface, wherein said at least one tube is arranged on said surface so that said tube is offset from said beam entry or exit area in a direction of propagation of said patterned beam and is adjacent to either said beam entry area or said beam exit area.

6. A lithographic projection apparatus according to claim 1, wherein said nucleated surface forms part of a protective cap which fits over at least said exit or entry area of said projection system.

7. A lithographic projection apparatus according to claim 6, wherein said cap is provided with attachment elements for attaching said protective cap onto said projection system.

8. A lithographic projection apparatus according to claim 6, wherein a purge hood is disposed between said protective cap and said at least one of said entry or exit areas of said projection system.

9. A lithographic projection apparatus according to claim 1, wherein said nucleated surface is disposed in a gas cleaning system.

10. A device manufacturing method comprising:

projecting a beam of radiation;

patterning the beam of radiation;

projecting the patterned beam of radiation using an optical element having a beam entry area and an optical element having a beam exit area through each of which said patterned beam passes, onto a target portion of the layer of radiation-sensitive material; and

capturing contaminants with a plurality of nucleation sites spaced from at least one of said beam entry area and said beam exit area.