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Photolithographic solid-phase polymer synthesis

  • US 7,144,700 B1
  • Filed: 07/21/2000
  • Issued: 12/05/2006
  • Est. Priority Date: 07/23/1999
  • Status: Expired due to Term
First Claim
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1. A method for removing a photolabile protecting group attached by a chemical bond to at least one monomer, comprising irradiating said photolabile protecting group in the presence of at least one sensitizer;

  • wherein said monomer is covalently attached to a solid support or a polymer, wherein said monomer is a nucleic acid, nucleotide, or nucleoside, and wherein said sensitizer is 9,10-dimethylanthracene.

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