Interface unit, lithographic projection apparatus comprising such an interface unit and a device manufacturing method
First Claim
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1. An interface unit comprising:
- a first object transfer path to transfer objects between a track configured to process objects and a lithographic exposure unit configured to expose objects, anda second object transfer path that extends through a closable transfer opening to an external space, the second object transfer path configured to facilitate the transfer of objects between the external space and the lithographic exposure unit,wherein the transfer of objects using the second object transfer path is controlled with a control unit.
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Abstract
An interface unit for transferring objects, such as substrates, is presented. The interface unit includes a first object transfer path to transfer objects between a track configured to process objects and a lithographic exposure unit configured to expose objects, wherein the interface unit is also provided with a second object transfer path extending through a closable transfer opening to an external space to transfer objects between the external space and the lithographic exposure unit. Furthermore, the invention relates to a lithographic apparatus provided with a lithographic exposure unit and an interface unit according to the invention.
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Citations
25 Claims
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1. An interface unit comprising:
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a first object transfer path to transfer objects between a track configured to process objects and a lithographic exposure unit configured to expose objects, and a second object transfer path that extends through a closable transfer opening to an external space, the second object transfer path configured to facilitate the transfer of objects between the external space and the lithographic exposure unit, wherein the transfer of objects using the second object transfer path is controlled with a control unit. - View Dependent Claims (2, 3, 5, 6, 7, 8, 9, 10, 11, 12, 22)
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4. An interface unit comprising:
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a first object transfer path to transfer objects between a track configured to process objects and a lithographic exposure unit configured to expose objects, and a second object transfer path that extends through a closable transfer opening to an external space, the second object transfer path configured to facilitate the transfer of objects between the external space and the lithographic exposure unit, wherein the interface unit is configured to be coupled to a Load Lock of said lithographic exposure unit having an enclosed vacuum space provided with a second opening closable by the Load Lock, wherein the first object transfer path extends through the second opening into the vacuum space.
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13. A lithographic apparatus comprising:
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(a) a lithographic exposure unit including; a radiation system configured to provide a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation; a substrate holder configured to hold a substrate; and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, (b) an interface unit coupled to the lithographic exposure unit, the interface unit including; a first object transfer path to transfer the substrate between a track configured to process substrates and the lithographic exposure unit configured to expose substrates, and a second object transfer path that extends through a closable transfer opening to an external space, the second object transfer path configured to facilitate the transfer of the substrate between the external space and the lithographic exposure unit, wherein the transfer of the substrate using the second object transfer path is controlled with a control unit. - View Dependent Claims (23)
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14. A device manufacturing method comprising:
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transferring a substrate to an exposure unit or a track unit via a first or a second object transfer path of an interface unit coupled to said exposure unit and said track unit, the first object path extending between the track unit and the exposure unit and the second object transfer path extending through a closable transfer opening to an external space, the second object transfer path configured to facilitate the transfer of objects between the external space and the exposure unit; providing a beam of radiation using a radiation system; patterning the beam of radiation with a pattern in its cross-section; projecting the patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on said substrate and controlling the transfer of the objects between the external space and the exposure unit using the second object transfer path with a control unit. - View Dependent Claims (15, 16, 24)
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17. A lithographic system comprising:
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a lithographic exposure unit configured to expose a substrate; a track unit comprising a plurality of processing stations configured to process said substrate; and an interface unit operatively associated with said lithographic exposure unit and said track unit, said interface unit being configured to transfer said substrate between said lithographic exposure unit and said track unit, said interface unit being further capable of receiving a substrate from a structure other than said lithographic exposure unit or said track unit and further capable of transferring said substrate from said other structure to said lithographic exposure unit and/or said track units, wherein said interface unit comprises a first object path to transfer said substrate between said lithographic exposure unit and said track unit and a second object path configured to transfer said substrate between said lithographic exposure unit and said structure, wherein said interface unit includes a closable opening through which said second object path extends, and wherein a transfer of the substrate using the second object transfer path is controlled with a control unit. - View Dependent Claims (18, 19, 20, 21, 25)
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Specification