Method of fabricating inkjet nozzle chambers
First Claim
1. A method of fabricating inkjet nozzle chambers on a substrate, each nozzle chamber comprising a roof having a nozzle aperture defined therein and sidewalls extending from the roof to the substrate, the method comprising the steps of:
- (a) depositing one or more layers of sacrificial material onto the substrate;
(b) defining openings in the sacrificial material, the openings being complementary to chamber sidewalls;
(c) depositing roof material by plasma enhanced chemical vapour deposition (PECVD) onto the sacrificial material and into the openings, thereby forming the roof and sidewalls of each chamber;
(d) etching nozzle apertures through the roof; and
(e) removing the sacrificial material exposed through the nozzle apertures.
4 Assignments
0 Petitions
Accused Products
Abstract
A method of fabricating inkjet nozzle chambers on a substrate is provided. Each nozzle chamber comprises a roof having a nozzle aperture defined therein and sidewalls extending from the roof to the substrate. The method comprises the steps of: (a) depositing one or more layers of sacrificial material onto the substrate; (b) defining openings in the sacrificial material, the openings being complementary to chamber sidewalls; (c) depositing roof material onto the sacrificial material and into the openings, thereby forming the roof and sidewalls of each chamber; (d) etching nozzle apertures through the roof; and (e) removing the sacrificial material exposed through the nozzle apertures.
19 Citations
9 Claims
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1. A method of fabricating inkjet nozzle chambers on a substrate, each nozzle chamber comprising a roof having a nozzle aperture defined therein and sidewalls extending from the roof to the substrate, the method comprising the steps of:
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(a) depositing one or more layers of sacrificial material onto the substrate; (b) defining openings in the sacrificial material, the openings being complementary to chamber sidewalls; (c) depositing roof material by plasma enhanced chemical vapour deposition (PECVD) onto the sacrificial material and into the openings, thereby forming the roof and sidewalls of each chamber; (d) etching nozzle apertures through the roof; and (e) removing the sacrificial material exposed through the nozzle apertures. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification