Integrated process condition sensing wafer and data analysis system
First Claim
Patent Images
1. A method of surveying conditions in a target environment comprising:
- robotically moving a process condition measuring device from a substrate carrier to a target environment;
acquiring data in the target environment and recording the data in the process condition measuring device;
robotically returning the process condition measuring device to the substrate carrier; and
transferring the data from the process condition measuring device to an electronics module attached to the substrate carrier while the process condition measuring device is in the substrate carrier.
0 Assignments
0 Petitions
Accused Products
Abstract
A process condition measuring device and a handling system may be highly integrated with a production environment where the dimensions of the process condition measuring device are close to those of a production substrate and the handling system is similar to a substrate carrier used for production substrates. A process condition measuring device surveys conditions in a target environment and records them in a memory for later transmission or downloading.
58 Citations
12 Claims
-
1. A method of surveying conditions in a target environment comprising:
-
robotically moving a process condition measuring device from a substrate carrier to a target environment; acquiring data in the target environment and recording the data in the process condition measuring device; robotically returning the process condition measuring device to the substrate carrier; and transferring the data from the process condition measuring device to an electronics module attached to the substrate carrier while the process condition measuring device is in the substrate carrier. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
Specification