×

System and method for verifying and controlling the performance of a maskless lithography tool

  • US 7,153,616 B2
  • Filed: 03/31/2004
  • Issued: 12/26/2006
  • Est. Priority Date: 03/31/2004
  • Status: Expired due to Fees
First Claim
Patent Images

1. A maskless lithography system, comprising:

  • a spatial light modulator that includes a plurality of spatial light modulator cells;

    a reference reticle having at least one reference feature, the reference reticle located in a plane with the spatial light modulator proximate to one of the plurality of spatial light modulator cells;

    a pattern rasterizer that applies a signal to the spatial light modulator to form a die pattern that includes the at least one reference feature;

    an illumination source that emits illumination energy to illuminate the spatial light modulator and the reference reticle;

    projection optics, having a pupil, that form a die image with illumination energy entering the pupil from the spatial light modulator and a reference image with illumination energy entering the pupil from the reference reticle; and

    a reference reticle postioner that positions the reference reticle to direct incident illumination energy from the illumination source away from the pupil of the projection optics.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×