Liquid crystal display device using seal pattern and fabricating method thereof
First Claim
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1. A liquid crystal display device, comprising:
- first and second substrates facing and spaced apart from each other;
a first inorganic insulating layer on inner surface of the first substrate;
a second inorganic insulating layer over the inner surface of the first substrate;
an organic insulating layer between the first and second inorganic insulating layers, the organic insulating layer being disposed below the second inorganic insulating layer; and
a seal pattern between the second inorganic insulating layer and an inner surface of the second substrate, the seal pattern contacting at least a part of the second inorganic insulating layer.
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Abstract
A liquid crystal display device includes first and second substrates facing and spaced apart from each other; a first inorganic insulating layer over an inner surface of the first substrate, and a seal pattern between the first inorganic insulating layer and an inner surface of the second substrate, the seal pattern contacting the first inorganic insulating layer. The device causes the seal pattern adhesive to have reduced chemical reactivity to thereby reduce the number of defects in the liquid crystal display.
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Citations
25 Claims
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1. A liquid crystal display device, comprising:
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first and second substrates facing and spaced apart from each other; a first inorganic insulating layer on inner surface of the first substrate; a second inorganic insulating layer over the inner surface of the first substrate; an organic insulating layer between the first and second inorganic insulating layers, the organic insulating layer being disposed below the second inorganic insulating layer; and a seal pattern between the second inorganic insulating layer and an inner surface of the second substrate, the seal pattern contacting at least a part of the second inorganic insulating layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A liquid crystal display device, comprising:
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first and second substrates facing and spaced apart from each other; a first inorganic insulating layer on an inner surface of the first substrate; a second inorganic insulating layer over the inner surface of the first substrate; an organic insulating layer between the first and second inorganic insulating layers; and a seal pattern between the second inorganic insulating layer and an inner surface of the second substrate, the seal pattern contacting the second inorganic insulating layer, wherein the first inorganic insulating layer has at least one groove through the second inorganic insulating layer and the organic insulating layer. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A fabricating method of a liquid crystal display device, comprising:
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forming a thin film transistor on a first substrate; forming a passivation layer covering the thin film transistor, and the passivation layer includes an organic material; forming an inorganic insulating layer on the passivation layer; forming a seal pattern surrounding the thin film transistor; and attaching a second substrate to the first substrate such that the seal pattern contacts the inorganic insulating layer and the second substrate. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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22. A fabricating method of a liquid crystal display device, comprising:
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forming a thin film transistor on a first substrate, wherein the step of forming the thin film transistor includes forming a gate electrode on the first substrate, forming a gate insulating layer on the gate electrode, and the gate insulating layer includes an inorganic material, forming an active layer on the gate insulating layer, and forming source and drain electrodes on the active layer; forming a passivation layer covering the thin film transistor, and the passivation layer includes an organic material; forming an inorganic insulating layer on the passivation layer; forming a seal pattern surrounding the thin film transistor; and attaching a second substrate to the first substrate such that the seal pattern contacts the inorganic insulating layer and the second substrate, wherein the method further comprises forming at least one groove through at least part of the gate insulating layer, the passivation layer and at least part of the inorganic insulating layer. - View Dependent Claims (23, 24, 25)
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Specification