Spatial light modulator, lithographic apparatus and device manufacturing method

• US 7,154,587 B2
• Filed: 06/25/2004
• Issued: 12/26/2006
• Est. Priority Date: 06/30/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US10/875,616
• Publication Number:
  US 20050024613A1
• Time in Patent Office: 914 Days
• Field of Search: 355/53, 355/55, 355/67, 355/71, 430/5, 430/20, 430/30, 359290-291
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A spatial light modulator used to pattern a radiation beam comprises an array of pixels disposed on a support. Each pixel has a light modulating element for modulating the radiation beam and a control circuit that positions the light modulating elements according to a desired pattern. The control circuit is disposed on the opposite side of the support than the light modulating elements. The control circuit comprises at least one of a digital to analog converter, an analog to digital converter, an optical fiber input, and a processor.

Claims

1. A spatial light modulator, comprising:

an array of pixels disposed on a support, each pixel in the array of pixels having a light modulating element that modulates an incident radiation beam;

an optical input device that receives an optical control signal including pattern data and generates a control signal therefrom; and

a control circuit that receives the control signal and positions the modulating elements according to the received control signal,

wherein said control circuit comprises;

a digital-to-to analog converter,

an analog-to-digital converter,

an optical-to-electrical converter, and

a plurality of processors, and

wherein the control circuit is coupled to an opposite side of the support than the light modulating element.

2. The spatial light modulator of claim 1, wherein at least one of the optical input device and said control circuit decompresses the pattern data.

3. The spatial light modulator of claim 1, wherein said control circuit calibrates each of the pixels of the array of pixels.

4. A lithographic projection apparatus, comprising:

a radiation system that provides a projection beam of radiation;

an array of pixels disposed on a support, each pixel in the array of pixels having a light modulating element that modulates the projection beam;

an optical input device that receives an optical control signal including pattern data and generates a control signal therefrom;

a control circuit that receives the control signal and positions the modulating elements according to the received control signal; and

a projection system that projects the patterned beam onto a target portion of a substrate,

wherein said control circuit comprises;

a digital-to-analog converter,

an analog-to-digital converter,

an optical-to-electrical converter, and

a plurality of processors, and

wherein the control circuit is coupled to an opposite side of the support than the light modulating element.

5. The lithographic projection apparatus of claim 4, wherein at least one of the optical input device and said control circuit decompresses the pattern data.

6. The lithographic projection apparatus claim 4, wherein said control circuit calibrates each of the pixels of the array of pixels.

7. A device manufacturing method, comprising:

converting a received optical control signal to an electrical control signal using a control circuit comprising.

a digital-to-analog converter,

an analog-to-digital converter,

an optical-to-electrical converter, and

a processor;

providing the electrical control signal to an array of pixels having light modulating elements, the array of pixels being disposed on a support such that the control circuit is coupled to an opposite side of the support than the array of pixels;

positioning each light modulating element of each pixel in an array of pixels based on the electrical signal;

patterning a projection beam of radiation using the array of pixels; and

projecting the patterned beam onto a target portion of a substrate.

8. The method of claim 7, further comprising decompressing compressed pattern data located within the optical control signal.

9. The method of claim 7, further comprising calibrating each of the pixels of the array of pixels.