Polymeric photoinitiators

• US 7,157,535 B2
• Filed: 06/18/2003
• Issued: 01/02/2007
• Est. Priority Date: 06/19/2002
• Status: Active Grant

• Current Assignee: Henkel AG & Co KGaA
• Original Assignee: National Starch and Chemical Investment Holding Corporation
• Inventors: Paul, Charles W., Hu, Ziyi, Humphreys, Robert W. R., Herr, Donald E.
• Primary Examiner(s): CHOI, LING SIU
• Application Number:
  US10/465,473
• Publication Number:
  US 20030236425A1
• Time in Patent Office: 1,294 Days
• Field of Search: 526/335, 526/348, 526/279, 522/905, 522/904, 522/40, 556/425, 556/436, 430/281.1
• US Class Current: 526/279
• CPC Class Codes: C07F 7/0838 Compounds with one or more Si-O-Si sequences compounds with a ring containing only alternating Si and O atoms, i.e. cyclosilanes C07F7/21
• CPC Class Codes: C08C 19/25 Incorporating silicon atoms into the molecule
• CPC Class Codes: C08F 2/50 with sensitising agents
• CPC Class Codes: C08F 8/32 by reaction with amines
• CPC Class Codes: C08F 8/34 Introducing sulfur atoms or sulfur-containing groups
• CPC Class Codes: C08F 8/42 Introducing metal atoms or metal-containing groups
• CPC Class Codes: C08L 2666/02 Organic macromolecular compounds, natural resins, waxes or and bituminous materials
• CPC Class Codes: C08L 53/02 of vinyl-aromatic monomers and conjugated dienes
• CPC Class Codes: C08L 53/025 modified
• CPC Class Codes: C09J 153/02 Vinyl aromatic monomers and conjugated dienes
• CPC Class Codes: C09J 153/025 modified
• CPC Class Codes: Y10S 430/114 Initiator containing
• CPC Class Codes: Y10S 522/904 Monomer or polymer contains initiating group
• CPC Class Codes: Y10S 522/905 Benzophenone group

Abstract

UV curable compositions, polymeric photoinitiators and precursors therefor are described.

Claims

1. A siloxane-linked photoinitiator having the following structure:

2. The photoinitiator of claim 1 wherein Q is selected from the group consisting of poly(butadiene), styrene-b-isoprene-b-styrene (SIS), styrene-b-butadiene-b-styrene (SBS), EPDM rubber, styrene-butadiene copolymers (SBR), and acrylate polymers containing pendant or backbone unsaturation.

3. A photocurable composition comprising the photoinitiator of claim 1.

4. The composition of claim 3 which is a pressure sensitive adhesive.

5. A thiol-ene photocurable composition comprising a multifunctional thiol, a multifunctional olefin, and a photoinitiator of claim 1.

6. A siloxane-linked photoinitiator having the following structure:

7. The photoinitiator of claim 6 wherein Q is selected from the group consisting of poly(butadiene), styrene-b-isoprene-b-styrene (SIS), styrene-b-butadiene-b-styrene (SBS), EPDM rubber, styrene-butadiene copolymers (SBR), and acrylate polymers containing pendant or backbone unsaturation.

8. A photocurable composition comprising the photoinitiator of claim 6.

9. The composition of claim 8, which is a pressure sensitive adhesive.

10. A thiol-ene photocurable composition comprising a multifunctional thiol, a multifunctional olefin, and a photoinitiator of claim 6.

11. A photoinitiator having the following structure:

12. A siloxane-linked photoinitiator derived from the reaction of the SiH-functional arylketone with an unsaturated compound, said SiH-functional arylketone having the following structure:

13. A photocurable composition comprising the photoinitiator of claim 12.

14. The composition of claim 13 which is a pressure sensitive adhesive.

15. A thiol-ene photocurable composition comprising a multifunctional thiol, a multifunctional olefin, and a photoinitiator of claim 12.

16. A siloxane-linked photoinitiator derived from the reaction of the SiH-functional arylketone with a polymer, said SiH-functional arylketone having the following structure:

17. A thiol-ene photocurable composition comprising a multifunctional thiol, a multifunctional olefin, and a photoinitiator of claim 16.