Lithographic apparatus and device manufacturing method

• US 7,158,208 B2
• Filed: 06/30/2004
• Issued: 01/02/2007
• Est. Priority Date: 06/30/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Gui, Cheng-Qun, De Jager, Pieter Willem Herman, Hoeberichts, Eduard, Spit, Peter
• Primary Examiner(s): FULLER, RODNEY EVAN
• Application Number:
  US10/880,435
• Publication Number:
  US 20060001847A1
• Time in Patent Office: 916 Days
• Field of Search: 355/30, 355/53, 355/77, 356/237.4, 356/237.5
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70983 Optical system protection, e.g. pellicles or removable covers for protection of mask

Abstract

A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a beam of radiation;

a patterning system that patterns the beam;

a projection system that projects the patterned beam onto a target portion of a substrate, the projection system comprising a lens array spaced from the substrate, such that each lens in the lens array focuses a respective part of the patterned beam onto the substrate;

a displacement system that causes relative displacement between the lens array and the substrate to increase a spacing between the lens array and the substrate;

a particle detector that detects particles on the substrate that are approaching the lens array as a result of relative displacement between the lens array and the substrate; and

a free working distance control system that increases the spacing between the lens array and the substrate in response to detection of a particle by the particle detector, such that the lens array is moved away from the substrate using the displacement system as relative displacement causes the detected particle to pass below the lens array.

2. The apparatus of claim 1, wherein:

the lens array is a component part of an optical engine; and

the free working distance control system controls the position of the optical engine relative to the substrate.

3. The apparatus of claim 1, wherein:

the lens array is a component part of an optical engine; and

the free working distance control system controls the position of the lens array relative to other components of the optical engine.

4. The apparatus of claim 1, further comprising:

at least two optical engines, each incorporating a lens array and a free working distance control system that controls the spacing between only the respective lens array and the substrate.

5. The apparatus of claim 1, further comprising:

a pellicle located between the lens array and the substrate.

6. The apparatus of claim 1, further comprising:

a cleaning device that removes contaminants from the substrate, the cleaning device being positioned upstream of the particle detector in the direction of relative displacement between the lens array and the substrate.

7. The apparatus of claim 1, wherein:

a substrate table holding the substrate and the lens array are stationary; and

the displacement system comprises a system that displaces the substrate across the substrate table beneath the lens array.

8. The apparatus of claim 1, wherein the free working distance control system is arranged to increase the spacing between the lens array to between about 2000 micrometers and about 5000 micrometers from between about 260 micrometers and about 800 micrometers.

9. A lithographic device manufacturing method, comprising:

(a) patterning a beam of radiation;

(b) projecting the patterned beam onto a target portion of a substrate through a lens array that is spaced from the substrate, such that each lens in the lens array focuses a respective part of the patterned beam onto the substrate;

(c) displacing the lens array with respect to the substrate toward and away from each other;

(d) detecting particles on the substrate that approach the lens array as a result of step (c); and

(e) increasing the spacing between the lens array and the substrate in response to step (d), such that the lens array is moved away from the substrate until relative displacement causes the detected particle to pass the lens array.

10. The method of claim 9, further comprising:

providing the lens array as part of an optical engine; and

moving the optical engine relative to the substrate to increase the spacing between the lens array and the substrate.

11. The method of claim 9, further comprising:

providing the lens array as part of an optical engine; and

moving the lens array relative to other components of the optical engine to increase the spacing between the lens array and the substrate.

12. The method of claim 9, further comprising:

using at least two optical engines each incorporating a lens array and a free working distance control system, wherein each free working distance control system controls only the spacing between the substrate and the lens array of a respective one of the at least two optical engines.

13. The method of claim 9, further comprising:

(f) mounting a pellicle between the lens array and the substrate.

14. The method of claim 9, further comprising:

(f) removing contaminants from the substrate before step (d) in the direction of relative displacement between the lens array and the substrate.

15. The method of claim 9, wherein the spacing between the lens array and the substrate is increased to between about 2000 and about 5000 micrometers from between about 260 and about 800 micrometers.