Large field of view protection optical system with aberration correctability for flat panel displays

• US 7,158,215 B2
• Filed: 04/26/2004
• Issued: 01/02/2007
• Est. Priority Date: 06/30/2003
• Status: Expired due to Fees

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Harned, Robert D., Gui, Cheng-Qun, de Jager, Patrick
• Primary Examiner(s): FULLER, RODNEY EVAN
• Application Number:
  US10/831,210
• Publication Number:
  US 20040263429A1
• Time in Patent Office: 981 Days
• Field of Search: 345/12, 359/366, 359/727, 359/730, 359/731, 355/51, 355/53, 355/55, 355/57, 355/60, 355/66, 355/67
• US Class Current: 355/66
• CPC Class Codes: G02B 17/061 on-axis systems with at least one of the mirrors having a central aperture
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/70233 Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
• CPC Class Codes: G03F 7/706 Aberration measurement
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

Claims

1. An exposure system, comprising:

a reticle stage adapted to support a reticle that is configured to pattern a beam of radiation;

a substrate stage adapted to support a substrate;

a reflective optical system adapted to direct the patterned beam onto said substrate, said reflective optical system comprising a primary mirror including a first mirror and a second mirror, and a secondary mirror;

a first optical device including a parallel glass plate, a parallel glass plate and meniscus lens pair, a nominally flat mirror with an aspheric profile, or a powered mirror located between the reticle stage and the primary mirror; and

a second optical device including a parallel glass plate, a parallel glass plate and meniscus lens pair, a nominally flat mirror with an aspheric profile, or a powered mirror located between the substrate stage and the primary mirror.

2. The exposure system of claim 1, wherein said reflective optical system has 1×

magnification.

3. The exposure system of claim 1, wherein said reflective optical system has a magnification of between 1×

and 10×

.

4. The exposure system of claim 1, wherein said first mirror is aspheric.

5. The exposure system of claim 1, wherein said first and second mirrors are concave, and said secondary mirror is convex.

6. The exposure system of claim 1, wherein said second mirror is aspheric.

7. The exposure system of claim 1, wherein said first, second and secondary mirrors are aspheric.

8. The exposure system of claim 1, wherein said secondary mirror is aspheric.

9. The exposure system of claim 1, wherein said reflective optical system has at least 10 degrees of freedom.

10. The exposure system of claim 1, wherein a radius of curvature of said secondary mirror is approximately half of radii of curvature of said first and second mirrors.

11. The exposure system of claim 1, wherein centers of curvature of said secondary mirror and said first and second mirrors are nominally coincident.

12. The exposure system of claim 1, wherein said substrate exposed by the exposure system has a diagonal measurement of up to about 42 inches.

13. The exposure system of claim 1, wherein said substrate exposed by the exposure system has a diagonal measurement of up to about 54 inches.

14. The exposure system of claim 1, wherein said substrate exposed by the exposure system has a diagonal measurement of up to about 60 inches.

15. The exposure system of claim 1, wherein said substrate exposed by the exposure system has a diagonal measurement of about 40 to about 60 inches.

16. The system of claim 1, wherein said centers of curvatures of said first and second mirrors are displaceable to provide fine magnification adjustment.

17. The system of claim 1, wherein said centers of curvatures of said first and second mirrors are displaceable to minimize aberrations resulting from magnification adjustment.

18. The system of claim 1, wherein said centers of curvatures of said first and second mirrors are displaceable to correct for any of residual optical manufacturing, coating and mount induced errors.

19. The system of claim 1, wherein said first and second mirrors have said substantially the same curvatures.

20. The system of claim 1, wherein only the first optical device comprises the a parallel glass plate.

21. The system of claim 20, wherein said parallel glass plate includes any of optical glasses, fused silica and optical crystal material.

22. The system of claim 20, wherein said glass plate has any of a spherical profile, an aspheric profile, a flat surface and a spherical surface, two spherical surfaces, a spherical surface and an aspherical surface, and two aspherical surfaces.

23. The system of claim 22, wherein any of the spherical and aspherical surfaces have concave curvatures.

24. The system of claim 22, wherein any of the spherical and aspherical surfaces have convex curvatures.

25. The system of claim 1, The system of claim 1, wherein the second optical device comprises only the parallel glass plate.

26. The system of claim 25, wherein said glass plate has any of a spherical profile, an aspheric profile, a flat surface and a spherical surface, two spherical surfaces, a spherical surface and an aspherical surface, and two aspherical surfaces.

27. The system of claim 25, wherein said parallel glass plate compensates for residual aberrations.

28. The system of claim 1, wherein the first and second optical devices comprise the parallel glass plates.

29. The system of claim 28, wherein said glass plates have any of a spherical profile, an aspheric profile, a flat surface and a spherical surface, two spherical surfaces, a spherical surface and an aspherical surface, and two aspherical surfaces.

30. The system of claim 1, wherein the first optical device comprises the meniscus lens and the glass plate.

31. The system of claim 30, wherein said meniscus lens has an aspheric profile on one or both of its surfaces.

32. The system of claim 1, wherein the first optical device comprises the nominally flat mirror with the aspheric profile positioned at an angle to said reticle.

33. The system of claim 1, wherein the second optical device comprises the a nominally flat mirror with the aspheric profile positioned at an angle to said substrate and near said substrate.

34. The system of claim 33, wherein the aspheric profile is different in a vertical and horizontal axes.

35. The system of claim 1, wherein the first and second optical devices comprise the nominally flat mirrors each having the aspheric profiles and being respectively positioned at an angle to said reticle and at an angle to said substrate.

36. The system of claim 1, wherein the first optical device comprises the a powered mirror with an aspheric profile positioned at an angle to said reticle.

37. The system of claim 1, wherein the second optical device comprises the a powered mirror with an aspheric profile positioned at an angle to said substrate and near said substrate.

38. The system of claim 1, wherein the first and second optical devices comprise the powered mirrors each having aspheric profiles and being respectively positioned at an angle with respect to said reticle at an angle with respect to said substrate.

39. The system of claim 1, wherein said system is a unit magnification annular optical system.

40. The system of claim 1, wherein said first and second mirrors having centers of curvature substantially coincident with said secondary mirror.

41. The system of claim 1, wherein said first and second mirrors are substantially symmetrically positioned with respect to a center of said secondary mirror.

42. The exposure system of claim 1, wherein said reflective optical system has sufficient degrees of freedom for both alignment and correction of aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

43. An exposure system for manufacturing flat panel displays (FPDs) comprising:

a substrate stage adapted to support an FPD substrate;

a reflective optical system adapted to image a reticle onto said FPD substrate, said reflective optical system consisting of a first mirror, a second mirror, and a third mirror as its powered reflective elements,

wherein said reflective optical system has at least 10 degrees of freedom when projecting an image of the reticle onto the FPD substrate by reflections off the first mirror, the second mirror, and the third mirror.

44. The exposure system of claim 43, wherein said reflective optical system has 1×

magnification.

45. The exposure system of claim 43, wherein said first mirror is aspheric.

46. The exposure system of claim 43, wherein said third mirror is aspheric.

47. The exposure system of claim 43, wherein said first, second and third mirrors are aspheric.

48. The exposure system of claim 43, wherein said second mirror is aspheric.

49. The exposure system of claim 43, wherein a radius of curvature of said second mirror is approximately half of radii of curvature of said first and third mirrors.

50. The exposure system of claim 43, wherein said reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations.

51. The exposure system of claim 43, wherein said reflective optical system has sufficient degrees of freedom for both alignment and correction of aberrations.

52. The system of claim 43, wherein centers of curvatures of said first and third mirrors are displaceable to provide fine magnification adjustment and to minimize said aberrations resulting from magnification adjustment.

53. The system of claim 43, wherein said first and third mirrors have substantially the same curvature.

54. The system of claim 43, further including a parallel glass plate near at least one of said reticle and said substrate.

55. The system of claim 54, wherein said glass plate has an aspheric profile.

56. The system of claim 43, further including a first parallel glass plate optically aligned between said reticle and said first mirror and a second parallel glass plate optically aligned between said substrate and said third mirror.

57. The system of claim 43, further including a meniscus lens near said glass plate and between said glass plate and said first mirror.

58. The system of claim 57, wherein said meniscus lens has an aspheric profile.

59. The system of claim 43, further including a nominally flat mirror with an aspheric profile positioned so as to fold an optical axis of the system and positioned near at least one of said reticle and said substrate.

60. The system of claim 43, further including a powered mirror with an aspheric profile positioned so as to fold an optical axis of the system and near at least one of said reticle and said substrate.

61. A system, comprising:

a mask that patterns a beam of radiation;

a projection optical system for projecting the patterned beam onto a substrate, said projection optical system including a first concave mirror, a second concave mirror and a convex mirror;

a first optical device including a glass plate, a glass plate and meniscus lens pair, a nominally flat mirror with an aspheric profile, or a powered mirror located between the reticle stage and the projection optical system; and

a second optical device including a glass plate, a glass plate and meniscus lens pair, a nominally flat mirror with an aspheric profile, or a powered mirror located between the substrate stage and the projection optical system.

62. The exposure system of claim 61, wherein said first concave mirror is aspheric.

63. The exposure system of claim 61, wherein said second concave mirror is aspheric.

64. The exposure system of claim 61, wherein said convex mirror is aspheric.

65. The exposure system of claim 61, wherein said reflective optical system has at least 10 degrees of freedom.

66. The exposure system of claim 61, wherein a radius of curvature of said secondary mirror is approximately half of radii of curvature of said first and second mirrors.

67. The system of claim 61, wherein the first optical device comprises the parallel glass plate.

68. The system of claim 67, wherein said glass plate has an aspheric profile.

69. The system of claim 61, wherein the second optical device comprises only the parallel glass plate.

70. The system of claim 69, wherein said glass plate has an aspheric profile.

71. The system of claim 61, wherein the first optical device comprises only the glass plate and the meniscus lens.

72. The system of claim 71, wherein said meniscus lens has an aspheric profile.

73. The system of claim 61, wherein the first optical device comprises the nominally flat mirror with the aspheric profile positioned so as to fold an optical axis of the system.

74. The system of claim 61, wherein the second optical device comprises the nominally flat mirror with the aspheric profile positioned so as to fold an optical axis of the system.

75. The system of claim 61, wherein the first optical device comprises the powered mirror with an aspheric profile positioned so as to fold an optical axis of the system.

76. The system of claim 61, wherein the second optical device comprises the powered mirror with an aspheric profile positioned so as to fold an optical axis of the system.

77. The system of claim 61, wherein the patterned beam is projected onto the substrate by passing through the first optical device, reflecting off the first concave mirror, the convex mirror, and the second concave mirror, and then passing through the second optical device.