Electro-optical device, manufacturing method of the same, and electronic apparatus

• US 7,158,694 B2
• Filed: 08/27/2004
• Issued: 01/02/2007
• Est. Priority Date: 09/04/2003
• Status: Active Grant

• Current Assignee: Intellectual Keystone Technology LLC (Samsung Electronics Co. Ltd.)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: Hayashi, Kenji, Nozawa, Ryoichi
• Primary Examiner(s): HEALY, BRIAN
• Application Number:
  US10/927,077
• Publication Number:
  US 20050084214A1
• Time in Patent Office: 858 Days
• Field of Search: 385/14, 385/129, 385/130, 385/131, 385/88, 385/89, 385/49, 385/901, 313/504, 313/306, 438/26, 438/27, 438/28, 438/29, 438/30, 438/31
• US Class Current: 385/14
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: H10K 2102/331 Nanoparticles used in non-emissive layers, e.g. in packaging layer
• CPC Class Codes: H10K 50/841 Self-supporting sealing arrangements
• CPC Class Codes: H10K 50/844 Encapsulations
• CPC Class Codes: H10K 59/12 Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/122 Pixel-defining structures or layers, e.g. banks
• CPC Class Codes: H10K 59/873 Encapsulations
• CPC Class Codes: Y10S 385/901 Illuminating or display apparatus

Abstract

To provide an electro-optical device in which the fluidity of a material for forming the underlying layer of a gas barrier layer is controlled, and the volume-change of the underlying layer is suppressed, so that stress-concentration on the gas barrier layer is relaxed, and to provide a method of producing the same and an electronic apparatus. In an electro-optical device 1 having, on a substrate 200, a plurality of first electrodes 23, a bank structure 221 having a plurality of openings 221a positioned correspondingly to the formed first electrodes 23, electro-optical layers 60 arranged in the respective openings, and a second electrode 50 covering the bank structure 221 and the electro-optical layers 60, the device 1 includes a buffer layer 210 formed so as to cover the second electrode 50 and have a substantially flat upper surface, and a gas barrier layer 30 covering the buffer layer 210.

Claims

1. An electro-optical device having, on a substrate, a plurality of first electrodes, a bank structure having a plurality of openings positioned correspondingly to the formed first electrodes, electro-optical layers arranged in the respective openings, and a second electrode covering the bank structure and the electro-optical layers,

the device including a buffer layer formed so as to cover the second electrode and have a substantially flat upper surface, and

a gas barrier layer covering the buffer layer.

2. An electro-optical device according to claim 1,

the buffer layer being made from an organic resin material having a lipophilic property, and being a cured coat formed by removing water, an organic solvent component, and the like under a reduced pressure after the coating of the organic resin material.

3. An electro-optical device according to claim 1,

the buffer layer being made from a UV curable resin.

4. An electro-optical device according to claim 1,

the buffer layer being formed with a material comprising a silicon-containing organic resin.

5. An electro-optical device according to claim 1,

the buffer layer being formed with an organic material containing a nitrogen atom in the principal chain.

6. An electro-optical device according to claim 1,

the buffer layer containing fine particles.

7. An electro-optical device according to claim 6,

the fine particles having a particle size of 10 nm to 1000 nm.

8. An electro-optical device according to claim 6,

the fine particles being contained in the buffer layer in such an amount as gives a content of 10 wt % to 70 wt %.

9. An electro-optical device according to claim 5,

the fine particles having a refractive index different from that of the buffer layer.

10. An electro-optical device according to claim 1,

an electrode protection layer to prevent the corrosion of the second electrode being provided between the second electrode and the buffer layer.

11. An electro-optical device according to claim 10,

the electrode protection layer being formed with a UV absorptive material.

12. An electro-optical device according to claim 1,

the walls defining the openings of the bank structure having an angle to 110°

to 170°

to the substrate thereof.

13. An electro-optical device according to claim 1,

the walls defining the openings of the bank structure being liquid-repellent at least at the surfaces thereof.

14. An electro-optical device according to claim 1,

the buffer layer covering the bank structure, ranging over the bank structure, so that the bank structure is not exposed.

15. An electro-optical device according to claim 14,

the gas barrier layer covering the buffer layer, ranging over the buffer layer, so that the buffer layer is not exposed.

16. An electro-optical device according to claim 15,

the gas barrier layer and/or the electrode protection layer being formed so as to come into contact with an insulation layer provided in the periphery of the substrate.

17. An electro-optical device according to claim 16,

the electrode protection layer and the gas barrier layer being formed so as to come into contact with each other in the outer periphery of the substrate.

18. An electro-optical device according to claim 1,

a surface protection layer being formed on the upper side of the gas barrier layer via an adhesion layer containing fine particles.

23. An electronic apparatus including the electro-optical device specified in claim 1.

19. A manufacturing method of an electro-optical device having, on a substrate, a plurality of first electrodes, a bank structure containing a plurality of openings positioned correspondingly to the formed first electrodes, electro-optical layers arranged in the openings, respectively, and a second electrode covering the bank structure and the electro-optical layers, comprising:

forming the buffer layer on the second electrode by a wet process, the buffer layer having a flat upper surface; and

forming the gas barrier layer on the buffer layer.

20. A manufacturing method of an electro-optical device according to claim 19,

the formation of said buffer layer being performed by forming the buffer layer with an organic material containing fine particles.

21. A manufacturing method of an electro-optical device according to claim 19,

the formation of said buffer layer being performed by forming the buffer layer with an organic material containing a nitrogen atom in the principal chain of the organic material.

22. A manufacturing method of an electro-optical device according to claim 19,

the formation of said buffer layer being performed by arranging a liquid buffer material above the second electrode by a wet coating process, and curing the liquid buffer material at atmosphere of a water vapor partial pressure less than 50 Pa.

24. An electronic apparatus including the electro-optical device produced by the production method specified by claim 19.