Toroidal low-field reactive gas source
First Claim
Patent Images
1. A toroidal plasma chamber for use with a reactive gas source comprising:
- an inlet for receiving a gas;
at least one plasma chamber wall for containing the gas, the plasma chamber wall comprising at least one of a metallic material or coated metallic material;
at least one dielectric spacer that electrically isolates the plasma chamber into a plurality of portions to prevent induced current flow from forming in the plasma chamber itself, the dielectric spacer being protected from a plasma formed in the plasma chamber by at least one plasma chamber wall; and
an outlet for outputting a reactive gas generated by the interaction of the plasma and the gas.
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Abstract
An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.
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Citations
11 Claims
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1. A toroidal plasma chamber for use with a reactive gas source comprising:
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an inlet for receiving a gas; at least one plasma chamber wall for containing the gas, the plasma chamber wall comprising at least one of a metallic material or coated metallic material; at least one dielectric spacer that electrically isolates the plasma chamber into a plurality of portions to prevent induced current flow from forming in the plasma chamber itself, the dielectric spacer being protected from a plasma formed in the plasma chamber by at least one plasma chamber wall; and an outlet for outputting a reactive gas generated by the interaction of the plasma and the gas.
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2. A toroidal plasma chamber for use with a reactive gas source comprising:
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an inlet for receiving a gas; one or more chamber walls for containing the gas, the chamber walls comprising at least one of a metallic material, coated metallic material or dielectric material and capable of receiving at least one dielectric spacer that electrically isolates a region of the plasma chamber to prevent induced current flow from forming in the plasma chamber itself, one or more of said plasma chamber walls capable of protecting the at least one dielectric spacer from a plasma formed in the plasma chamber; and an outlet for outputting a reactive gas generated by the interaction of the plasma and the gas. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification