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X-ray multi-layer mirror and x-ray exposure apparatus

  • US 7,162,009 B2
  • Filed: 07/30/2004
  • Issued: 01/09/2007
  • Est. Priority Date: 08/08/2003
  • Status: Expired due to Fees
First Claim
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1. An X-ray multi-layer mirror comprising an Mo/Si alternate layer with a non-uniform, non-periodic film thickness structure, which is produced by conducting optimization processing for widening an X-ray reflection characteristic on a constant film thickness fundamental structure of an Mo/Si alternate layer having the X-ray reflection characteristic, wherein each one of Mo layers and Si layers for forming the non-uniform film thickness structure is designed to have a film thickness of 1.5 nm or more.

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