Tunable-wavelength optical filter and method of manufacturing the same
First Claim
1. A method of manufacturing a tunable wavelength optical filter, comprising the steps of:
- (a) forming a sacrificial oxide film for floating a mirror on a semiconductor substrate;
(b) sequentially laminating conductive silicon films and oxide films for defining a mirror region on said sacrificial oxide film in a multi-layer and laminating another conductive silicon film to form a mirror;
(c) etching the rear side of said semiconductor substrate to form an opening for inserting an optical fiber thereinto;
(d) forming electrode pads for controlling the gap between the mirrors by an electrostatic force;
(e) etching the silicon film around said mirror in a dry etching method to expose said sacrificial oxide film, such that said mirror is suspended by a connecting means; and
(f) etching said sacrificial oxide film with hydrogen fluoride such that said mirror is floated on said semiconductor substrate;
wherein two semiconductor substrate formed by said steps (a) to (f) are prepared and are attached to each other through a spacer layer therebetween so that the mirrors of said semiconductor substrates are opposite to each other.
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Accused Products
Abstract
An active type tunable wavelength optical filter having a Fabry-Perot structure is disclosed. A tunable wavelength optical filter which comprises a lower mirror in which silicon films and oxide films are sequentially laminated in a multi-layer and the silicon film is laminated on the highest portion; an upper mirror in which silicon films and oxide films are sequentially laminated in a multi-layer and the silicon film is laminated on the highest portion and which is spaced away from the lower mirror by a predetermined distance; a connecting means for connecting and supporting the lower mirror and the upper mirror to a semiconductor substrate; and electrode pads for controlling the gap between the lower mirror and the upper mirror by an electrostatic force and the method of manufacturing the same are provided. Thereby, by finely driving the upper and lower mirrors composed of a multi-layer structure of the silicon film and the oxide film by the electrostatic force, the wavelength of the transmitted light with respect to the incident light can be selectively sent.
21 Citations
11 Claims
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1. A method of manufacturing a tunable wavelength optical filter, comprising the steps of:
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(a) forming a sacrificial oxide film for floating a mirror on a semiconductor substrate; (b) sequentially laminating conductive silicon films and oxide films for defining a mirror region on said sacrificial oxide film in a multi-layer and laminating another conductive silicon film to form a mirror; (c) etching the rear side of said semiconductor substrate to form an opening for inserting an optical fiber thereinto; (d) forming electrode pads for controlling the gap between the mirrors by an electrostatic force; (e) etching the silicon film around said mirror in a dry etching method to expose said sacrificial oxide film, such that said mirror is suspended by a connecting means; and (f) etching said sacrificial oxide film with hydrogen fluoride such that said mirror is floated on said semiconductor substrate; wherein two semiconductor substrate formed by said steps (a) to (f) are prepared and are attached to each other through a spacer layer therebetween so that the mirrors of said semiconductor substrates are opposite to each other. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of manufacturing a tunable wavelength optical filter, comprising the steps of:
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(a) forming a sacrificial oxide film for floating a mirror on a semiconductor substrate; (b) sequentially laminating conductive silicon films and oxide films for defining a mirror region on said sacrificial oxide film in a multi-layer and laminating another conductive silicon film to form a mirror; (c) depositing a first conductive silicon film on said sacrificial oxide film, (d) depositing a first oxide film on said first silicon film and patterning the first oxide film to define a mirror region; (e) depositing a second silicon film on said first silicon film and said patterned first oxide film; (f) depositing a second oxide film on said second silicon film and patterning the second oxide film to define the mirror region; (g) forming a third conductive silicon film on said second silicon film and said patterned second oxide film; (h) etching the rear side of said semiconductor substrate to form an opening for inserting an optical fiber thereinto; (i) forming electrode pads for controlling the gap between the mirrors by an electrostatic force; (j) etching the silicon film around said mirror in a dry etching method to expose said sacrificial oxide film, such that said mirror is suspended by a connecting means; and (k) etching said sacrificial oxide film such that said mirror is floated on said semiconductor substrate; wherein two semiconductor substrate formed by said steps (a) to (k) are prepared and are attached to each other through a spacer layer therebetween so that the mirrors of said semiconductor substrates are opposite to each other. - View Dependent Claims (8, 9, 10, 11)
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Specification