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Apparatus for optical inspection of wafers during processing

  • US 7,169,015 B2
  • Filed: 06/04/2004
  • Issued: 01/30/2007
  • Est. Priority Date: 05/23/1995
  • Status: Expired due to Term
First Claim
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1. A measurement station for use with a processing machine, which includes a processing station for processing an article and an exit station including an article transfer assembly and at least one articles'"'"' cassette, the measurement station being so dimensioned as to be installable in association with the exit station of the processing machine and comprising an optical system and a holding unit for receiving and holding the article in a measuring position during measurements, said optical system comprising:

  • a spectrophotometer;

    an imaging system operable to locate measurements;

    a beam directing assembly for directing illuminating light towards the article and directing collected light from the article towards a beam splitting assembly for separating a first portion of the collected light to propagate towards the spectrophotometer and a second portion to propagate to said imaging system.

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