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Method of forming nanofluidic channels

  • US 7,169,251 B2
  • Filed: 05/13/2003
  • Issued: 01/30/2007
  • Est. Priority Date: 05/13/2002
  • Status: Expired due to Fees
First Claim
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1. A method of forming enclosed nanofluidic channels, said method comprising:

  • providing a first substrate having a layer of a first material thereon;

    providing a second substrate;

    forming a slot of nanoscale depth along said second substrate, said slot being formed by nanolithography and etching; and

    bonding said first substrate to said second substrate such that said layer of said first material on said first substrate is adjacent said slot on said second substrate to define an enclosed nanofluidic channel therethrough.

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