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Method of making thin silicon sheets for solar cells

  • US 7,169,669 B2
  • Filed: 12/04/2002
  • Issued: 01/30/2007
  • Est. Priority Date: 12/04/2001
  • Status: Expired due to Fees
First Claim
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1. A process for producing a layer of single-crystal silicon, said process comprising the steps of forming parallel, first trenches in a silicon substrate of substantially (111) orientation;

  • applying an etch-resistant layer to the surface of said first trenches;

    forming a series of narrower second trenches inside said first trenches;

    contacting said second trenches with an etchant to which {111} planes of silicon are substantially resistant, and etching lateral channels from said second trenches until adjacent and opposing etch fronts at least substantially meet, thereby defining said layer of single-crystal silicon; and

    detaching said layer from said substrate.

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