Method and apparatus for synchronizing data acquisition of a monitored IC fabrication process

• US 7,171,334 B2
• Filed: 06/01/2004
• Issued: 01/30/2007
• Est. Priority Date: 06/01/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: Brion Technologies Incorporated (ASML Holding NV)
• Inventors: Gassner, Michael J.
• Primary Examiner(s): Barlow; John
• Assistant Examiner(s): VO, HIEN XUAN
• Application Number:
  US10/858,330
• Publication Number:
  US 20050288893A1
• Time in Patent Office: 973 Days
• Field of Search: 702/182, 702/127, 702/117, 702/116, 702/132, 702/136, 702184-185, 700/108, 700/121, 438/16, 438/18, 438/24, 438/5, 438/10, 156/345.13
• US Class Current: 702/182
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring

Abstract

There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for autonomously monitoring fabrication equipment, for example, integrated circuit fabrication equipment. In one embodiment of this aspect of the invention, the present invention is an autonomous monitoring device including one or more event sensors (for example, acceleration, motion, velocity and/or inertial sensing device(s)) to detect a predetermined event of or by the fabrication equipment (for example, an event that is indicative of the onset, commencement, initiation and/or launch of fabrication process or sub-processes of or by the fabrication equipment). In response thereto, one or more process parameter sensors sample, sense, detect, characterize, analyze and/or inspect one or more parameters of the process in real time (i.e., during the fabrication process).

Claims

1. A device comprising:

a substrate having a wafer-like shape capable of being disposed within integrated circuit processing equipment, the substrate comprising;

an event sensor, to generate an output representative of an event related to the integrated circuit processing equipment, and

a process parameter sensor to sense a process parameter of a process performed by the integrated circuit processing equipment, wherein the process parameter sensor senses the process parameter in response to a control signal; and

a controller, coupled to the event sensor and coupled to the process parameter sensor, to receive the output from the event sensor and to detect at least one predetermined event based on the output, wherein the controller generates the control signal in response to detecting the at least one predetermined event and provides the control signal to the process parameter sensor.

2. The device of claim 1 wherein the substrate is capable of being disposed on a wafer stage of the integrated circuit processing equipment.

3. The device of claim 2 wherein the event sensor is an accelerometer and the output is representative of the acceleration of the wafer stage of the integrated circuit processing equipment.

4. The device of claim 2 wherein the event sensor is a velocity, inertial or position sensor.

5. The device of claim 2 wherein the integrated circuit processing equipment is lithographic equipment and the process parameter sensor is an image sensor that samples the intensity of an aerial image of a photomask produced by the integrated circuit processing equipment.

6. The device of claim 5 wherein the event sensor is an accelerometer and the output is representative of the acceleration of the wafer stage of the integrated circuit processing equipment.

7. The device of claim 5 wherein the event sensor is a velocity, inertial or position sensor.

8. The device of claim 1 wherein the controller detects the at least one predetermined event by analyzing the output of the event sensor using a plurality of predetermined criteria.

9. The device of claim 1 further comprising:

communications circuitry, coupled to the controller, to provide data representative of the process parameter to external circuitry; and

at least one rechargeable battery to provide electrical power to the controller and the process parameter sensor.

10. A device comprising:

a substrate capable of being disposed on a wafer stage of integrated circuit processing equipment, the substrate comprising;

a first event sensor to generate a first output representative of a first event related to the integrated circuit processing equipment,

a second event sensor to generate a second output representative of a second event related to the integrated circuit processing equipment, wherein the first and second events are different types of events, and

a process parameter sensor to sense a process parameter of a process performed by the integrated circuit processing equipment, wherein the process parameter sensor senses the process parameter in response to a control signal; and

a controller, coupled to the first and second event sensors and coupled to the process parameter sensor, to receive the second output from the second event sensor and to detect at least one predetermined event based on the second output, wherein the controller generates the control signal in response to detecting the at least one predetermined event and provides the control signal to the process parameter sensor.

11. The device of claim 10 wherein the first output is representative of whether the substrate is disposed on the wafer stage of the integrated circuit processing equipment.

12. The device of claim 11 wherein the second event sensor is a velocity, inertial, acceleration or position sensor.

13. The device of claim 12 wherein the process parameter sensor senses temperature, pressure, chemical concentration, fluid flow rate, illumination intensity, image projection, focus, photomask integrity, aerial image integrity or surface profile.

14. The device of claim 10 wherein the integrated circuit processing equipment is lithographic equipment and the process parameter sensor is an image sensor that samples the intensity of an aerial image of a photomask produced by the integrated circuit processing equipment.

15. The device of claim 14 wherein the second event sensor is an accelerometer and the second out put is representative of the acceleration of the wafer stage of the integrated circuit processing equipment.

16. The device of claim 14 wherein the second event sensor is a velocity, inertial or position sensor.

17. The device of claim 10 wherein the first output is representative of whether the substrate is disposed on the wafer stage of the integrated circuit processing equipment and wherein the controller, in response to the first output generates an enable signal and provides the enable signal to the process parameter sensor.

18. The device of claim 17 wherein the enable signal enables the process parameter sensor to sense the process parameter.

19. The device of claim 10 wherein the controller detects the at least one predetermined event by analyzing the second output using a plurality of predetermined criteria.

20. The device of claim 19 wherein the controller includes data storage to store the plurality of predetermined criteria.

21. The device of claim 10 further comprising:

communications circuitry, coupled to the controller, to provide data representative of the process parameter to external circuitry; and

at least one rechargeable battery to provide electrical power to the controller and the process parameter sensor.

22. A device comprising:

a substrate capable of being disposed on a wafer stage of integrated circuit processing equipment, the substrate comprising;

an event sensor to generate an output representative of acceleration, velocity, inertia or motion of the substrate, and

a process parameter sensor to sense a process parameter of a process performed by the integrated circuit processing equipment, wherein the process parameter sensor senses the process parameter in response to a data acquisition signal; and

a controller, coupled to the event sensor and the process parameter sensor, to receive the output from the event sensor and to detect at least one predetermined event based on the output, wherein the controller generates the data acquisition signal in response to detecting the predetermined event and provides the data acquisition signal to the process parameter sensor.

23. The device of claim 22 wherein the integrated circuit processing equipment is lithographic equipment and the process parameter sensor is an image sensor that samples the intensity of an aerial image of a photomask produced by the integrated circuit processing equipment.

24. The device of claim 22 wherein the controller detects the at least one predetermined event by analyzing the output of the event sensor using a plurality of predetermined criteria.

25. The device of claim 24 wherein the controller includes data storage to store the plurality of predetermined criteria.

26. The device of claim 22 further comprising:

communications circuitry, coupled to the controller, to provide data representative of the process parameter to external circuitry; and

at least one rechargeable battery, to provide electrical power to the controller and the process parameter sensor.