Method for plasma formation for extreme ultraviolet lithography-theta pinch

• US 7,180,082 B1
• Filed: 02/22/2005
• Issued: 02/20/2007
• Est. Priority Date: 02/19/2004
• Status: Expired due to Fees

• Current Assignee: United States Department of Energy (Government of the United States of America)
• Original Assignee: United States Department of Energy (Government of the United States of America)
• Inventors: Hassanein, Ahmed, Rice, Bryan, Konkashbaev, Isak
• Primary Examiner(s): Berman; Jack
• Assistant Examiner(s): YANTORNO, JENNIFER M
• Application Number:
  US11/066,655
• Time in Patent Office: 728 Days
• Field of Search: 250/504.R
• US Class Current: 250/504.00R
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G03F 7/70033 by plasma extreme ultraviolet [EUV] sources
• CPC Class Codes: H05G 2/003 the plasma being generated from a material in a liquid or gas state
• CPC Class Codes: H05G 2/005 containing a metal as principal radiation generating component

Abstract

A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

Claims

1. A device for generating/producing an extremely short-wave ultraviolet electromagnetic wave without electrodes, comprising:

an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone;

means for generating a magnetic field radially outward of the open-ended pinch chamber compressing the plasma to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range;

collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation;

and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

2. The device for generating/producing extremely short-wave ultraviolet electromagnetic wave of claim 1 wherein the plasma generating gas is selected from the group consisting of xenon, vaporized tin and vaporized lithium.

3. The device for generating/producing extremely short-wave ultraviolet electromagnetic wave of claim 1 wherein the means for generating the magnetic field will produce a magnetic field of from about 7.5 kG to about 10 kG.

4. The device for generating/producing extremely short-wave ultraviolet electromagnetic wave of claim 1 wherein plasma is generated at a temperature from about 20 eV to about 40 eV.

5. The device for generating/producing extremely short-wave ultraviolet electromagnetic wave of claim 1 wherein the extremely short-wave ultraviolet electromagnetic wavelength is from about 10 nm to about 20 nm.

6. The device for generating/producing extremely short-wave ultraviolet electromagnetic wave of claim 1 wherein the extremely short-wave ultraviolet electromagnetic wavelength is about 13.5 nm.

7. A method for generating/producing extremely short-wave ultraviolet electromagnetic wave without the use of electrodes, comprising:

providing an open-ended pinch chamber defining a plasma zone;

providing a plasma generating gas within the plasma zone;

generating a magnetic field radially outward of the open-ended pinch chamber compressing the plasma to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range, said electromagnetic wave emanating from the ends of the plasma zone; and

collecting/focusing the electromagnetic wave emanating from the ends of the pinch chamber to collect the electromagnetic radiation.

8. The method for generating/producing extremely short-wave ultraviolet electromagnetic wave without the use of electrodes of claim 7, further comprising focusing the electromagnetic wave to provide a coherent beam of electromagnetic radiation.

9. The method for generating/producing extremely short-wave ultraviolet electromagnetic wave without the use of electrodes of claim 7, wherein the plasma generating gas is selected from the group consisting of xenon, vaporized tin and vaporized lithium.

10. The method for generating/producing extremely short-wave ultraviolet electromagnetic wave without the use of electrodes of claim 7, wherein the magnetic field generated is from about 7.5 kG to about 10 kG.

11. The method for generating/producing extremely short-wave ultraviolet electromagnetic wave without the use of electrodes of claim 7, wherein plasma is generated at a temperature from about 20 eV to about 40 eV.

12. The method for generating/producing extremely short-wave ultraviolet electromagnetic wave without the use of electrodes of claim 7, wherein the extremely short-wave ultraviolet electromagnetic wavelength is from about 10 nm to about 20 nm.

13. The method for generating/producing extremely short-wave ultraviolet electromagnetic wave without the use of electrodes of claim 7, wherein the extremely short-wave ultraviolet electromagnetic wavelength is about 13.5 nm.