Semiconductor device having a stacked gate insulation film and a gate electrode and manufacturing method thereof
First Claim
1. A field effect type semiconductor device having a gate insulation film and a gate electrode on a surface of a semiconductor layer,said gate insulation film consisting of a thermal oxide film and a CVD oxide film,said thermal oxide film and said CVD film formed on the surface of said semiconductor layer in this order,said gate insulation film having nitrogen segregated at an interface region between at least one of said gate insulation film and said gate electrode, and said gate insulation film and said semiconductor layer, whereina concentration of nitrogen along an entirety of said gate insulation film, excluding the vicinity of both interface regions, is higher than the average concentration of nitrogen in said semiconductor layer or said gate electrode.
0 Assignments
0 Petitions
Accused Products
Abstract
A semiconductor device of the present invention includes an MOSFET which has a stacked gate insulation film formed of at least two types of insulation films, that is, a thermal oxide film provided on a semiconductor substrate and a CVD oxide film provided nearer to a gate electrode than thermal oxide film. The stacked insulation film is provided so that the ratio of the thickness of the CVD oxide film to that of the entire stacked gate insulation film is at least 20%. By such a structure, the gate insulation film thickness is kept uniform. Further, nitrogen may be segregated at an interface between the thermal oxide film and a semiconductor substrate and an interface between the gate electrode and the CVD oxide film. Thus, the occurrence of interface states is prevented between the gate insulation film and the semiconductor substrate as well as between the gate insulation film and the gate electrode. As a result, a semiconductor device with improved gate insulation film and transistor characteristics of an MOSFET as well as a manufacturing method thereof are obtained.
7 Citations
3 Claims
-
1. A field effect type semiconductor device having a gate insulation film and a gate electrode on a surface of a semiconductor layer,
said gate insulation film consisting of a thermal oxide film and a CVD oxide film, said thermal oxide film and said CVD film formed on the surface of said semiconductor layer in this order, said gate insulation film having nitrogen segregated at an interface region between at least one of said gate insulation film and said gate electrode, and said gate insulation film and said semiconductor layer, wherein a concentration of nitrogen along an entirety of said gate insulation film, excluding the vicinity of both interface regions, is higher than the average concentration of nitrogen in said semiconductor layer or said gate electrode.
Specification